JPS5352072A - Pattern for alignment - Google Patents

Pattern for alignment

Info

Publication number
JPS5352072A
JPS5352072A JP12614376A JP12614376A JPS5352072A JP S5352072 A JPS5352072 A JP S5352072A JP 12614376 A JP12614376 A JP 12614376A JP 12614376 A JP12614376 A JP 12614376A JP S5352072 A JPS5352072 A JP S5352072A
Authority
JP
Japan
Prior art keywords
pattern
alignment
wafer
seciconductor
lectile
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12614376A
Other languages
Japanese (ja)
Other versions
JPS5619734B2 (en
Inventor
Nobuyuki Akiyama
Tomohiro Kuji
Mitsuyoshi Koizumi
Yoshimasa Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12614376A priority Critical patent/JPS5352072A/en
Publication of JPS5352072A publication Critical patent/JPS5352072A/en
Publication of JPS5619734B2 publication Critical patent/JPS5619734B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE: To prevent a photo-resistor - which is applied while being rotated from occurring the drift to improve a positioning precision between a lectile and a wafer, by providing a stripe pattern - which goes toward the radial direction from the center - in an alignment pattern to be formed on a seciconductor wafer.
COPYRIGHT: (C)1978,JPO&Japio
JP12614376A 1976-10-22 1976-10-22 Pattern for alignment Granted JPS5352072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12614376A JPS5352072A (en) 1976-10-22 1976-10-22 Pattern for alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12614376A JPS5352072A (en) 1976-10-22 1976-10-22 Pattern for alignment

Publications (2)

Publication Number Publication Date
JPS5352072A true JPS5352072A (en) 1978-05-12
JPS5619734B2 JPS5619734B2 (en) 1981-05-09

Family

ID=14927730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12614376A Granted JPS5352072A (en) 1976-10-22 1976-10-22 Pattern for alignment

Country Status (1)

Country Link
JP (1) JPS5352072A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS5533145A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Positioning sensor
JPS5533146A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Photoelectric element for detecting and positioning register mark for engraving
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device
JPS59101829A (en) * 1982-12-01 1984-06-12 Canon Inc Arranging method of alignment mark
JPS60196944A (en) * 1984-07-30 1985-10-05 Hitachi Ltd Method for detecting pattern positioned on wafer
JPS61123139A (en) * 1985-10-11 1986-06-11 Canon Inc Alignment apparatus
JPS62122129A (en) * 1986-05-09 1987-06-03 Hitachi Ltd Detector for position of pattern on wafer
JPH01103835A (en) * 1988-08-26 1989-04-20 Hitachi Ltd Specimen of semiconductor wafer or the like to be exposed

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6216012B2 (en) * 1977-03-10 1987-04-10 Canon Kk
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS5533145A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Positioning sensor
JPS5533146A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Photoelectric element for detecting and positioning register mark for engraving
JPS5856402B2 (en) * 1978-08-30 1983-12-14 大日本スクリ−ン製造株式会社 Positioning sensor
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device
JPS6227536B2 (en) * 1978-09-20 1987-06-15 Hitachi Ltd
JPS59101829A (en) * 1982-12-01 1984-06-12 Canon Inc Arranging method of alignment mark
JPS60196944A (en) * 1984-07-30 1985-10-05 Hitachi Ltd Method for detecting pattern positioned on wafer
JPS6151415B2 (en) * 1984-07-30 1986-11-08 Hitachi Ltd
JPS61123139A (en) * 1985-10-11 1986-06-11 Canon Inc Alignment apparatus
JPS62122129A (en) * 1986-05-09 1987-06-03 Hitachi Ltd Detector for position of pattern on wafer
JPH0152893B2 (en) * 1986-05-09 1989-11-10 Hitachi Ltd
JPH01103835A (en) * 1988-08-26 1989-04-20 Hitachi Ltd Specimen of semiconductor wafer or the like to be exposed
JPH0445968B2 (en) * 1988-08-26 1992-07-28 Hitachi Ltd

Also Published As

Publication number Publication date
JPS5619734B2 (en) 1981-05-09

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