JPS533169A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS533169A JPS533169A JP7751176A JP7751176A JPS533169A JP S533169 A JPS533169 A JP S533169A JP 7751176 A JP7751176 A JP 7751176A JP 7751176 A JP7751176 A JP 7751176A JP S533169 A JPS533169 A JP S533169A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- mesa
- openings
- directin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To form even mesa grooves or mesa-cut faces in the openings in an X directin and Y direction by relatively moving a semiconductor wafer and an etchant at an angle of approximately 45° to the openings of a mesa cover.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7751176A JPS533169A (en) | 1976-06-30 | 1976-06-30 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7751176A JPS533169A (en) | 1976-06-30 | 1976-06-30 | Production of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS533169A true JPS533169A (en) | 1978-01-12 |
JPS5716737B2 JPS5716737B2 (en) | 1982-04-07 |
Family
ID=13635981
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7751176A Granted JPS533169A (en) | 1976-06-30 | 1976-06-30 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS533169A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61184744U (en) * | 1985-05-08 | 1986-11-18 | ||
JP2014067773A (en) * | 2012-09-25 | 2014-04-17 | Canon Inc | Silicon substrate etching method |
-
1976
- 1976-06-30 JP JP7751176A patent/JPS533169A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61184744U (en) * | 1985-05-08 | 1986-11-18 | ||
JP2014067773A (en) * | 2012-09-25 | 2014-04-17 | Canon Inc | Silicon substrate etching method |
Also Published As
Publication number | Publication date |
---|---|
JPS5716737B2 (en) | 1982-04-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51111072A (en) | Photo etching method | |
JPS533169A (en) | Production of semiconductor device | |
JPS51136289A (en) | Semi-conductor producing | |
JPS5363871A (en) | Production of semiconductor device | |
JPS53127266A (en) | Forming method of marker | |
JPS5313366A (en) | Manufacture of mesa-type semiconductor device | |
JPS52144277A (en) | Manufacturing device of semiconductor | |
JPS538072A (en) | Semiconductor device | |
JPS5228868A (en) | Semiconductor device | |
JPS52153383A (en) | Preparation of semiconductor device | |
JPS5346222A (en) | Solid state pick up unit | |
JPS5335386A (en) | Production of semiconductor device | |
JPS5315765A (en) | Vacuum caontact prevention method of hard mask | |
JPS5359368A (en) | Plasma etching | |
JPS5363866A (en) | Production of semiconductor device | |
JPS51112279A (en) | Semiconductor device | |
JPS5377168A (en) | Production of semiconductor device | |
JPS5368070A (en) | Etching method | |
JPS542666A (en) | Manufacture of semiconductor device | |
JPS52143186A (en) | Taping device | |
JPS5251872A (en) | Production of semiconductor device | |
JPS5260581A (en) | Semiconductor device | |
JPS52155972A (en) | Production of semiconductor device | |
JPS5370673A (en) | Production of semiconductor device | |
JPS5347779A (en) | Production of semiconductor device |