JPS5619734B2 - - Google Patents
Info
- Publication number
- JPS5619734B2 JPS5619734B2 JP12614376A JP12614376A JPS5619734B2 JP S5619734 B2 JPS5619734 B2 JP S5619734B2 JP 12614376 A JP12614376 A JP 12614376A JP 12614376 A JP12614376 A JP 12614376A JP S5619734 B2 JPS5619734 B2 JP S5619734B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12614376A JPS5352072A (en) | 1976-10-22 | 1976-10-22 | Pattern for alignment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12614376A JPS5352072A (en) | 1976-10-22 | 1976-10-22 | Pattern for alignment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5352072A JPS5352072A (en) | 1978-05-12 |
| JPS5619734B2 true JPS5619734B2 (en) | 1981-05-09 |
Family
ID=14927730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12614376A Granted JPS5352072A (en) | 1976-10-22 | 1976-10-22 | Pattern for alignment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5352072A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
| JPS5533146A (en) * | 1978-08-30 | 1980-03-08 | Dainippon Screen Mfg Co Ltd | Photoelectric element for detecting and positioning register mark for engraving |
| JPS5856402B2 (en) * | 1978-08-30 | 1983-12-14 | 大日本スクリ−ン製造株式会社 | Positioning sensor |
| JPS5541739A (en) * | 1978-09-20 | 1980-03-24 | Hitachi Ltd | Micro-projection type mask alignment device |
| JPS59101829A (en) * | 1982-12-01 | 1984-06-12 | Canon Inc | Arranging method of alignment mark |
| JPS60196944A (en) * | 1984-07-30 | 1985-10-05 | Hitachi Ltd | Method for detecting pattern positioned on wafer |
| JPS61123139A (en) * | 1985-10-11 | 1986-06-11 | Canon Inc | Alignment apparatus |
| JPS62122129A (en) * | 1986-05-09 | 1987-06-03 | Hitachi Ltd | Detector for position of pattern on wafer |
| JPH01103835A (en) * | 1988-08-26 | 1989-04-20 | Hitachi Ltd | Specimen of semiconductor wafer or the like to be exposed |
-
1976
- 1976-10-22 JP JP12614376A patent/JPS5352072A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5352072A (en) | 1978-05-12 |