JPS52130570A - Electron beam exposing device - Google Patents

Electron beam exposing device

Info

Publication number
JPS52130570A
JPS52130570A JP4810076A JP4810076A JPS52130570A JP S52130570 A JPS52130570 A JP S52130570A JP 4810076 A JP4810076 A JP 4810076A JP 4810076 A JP4810076 A JP 4810076A JP S52130570 A JPS52130570 A JP S52130570A
Authority
JP
Japan
Prior art keywords
electron beam
converter
deflecting device
exposing device
beam exposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4810076A
Other languages
Japanese (ja)
Other versions
JPS5311832B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Shinji Takayanagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP4810076A priority Critical patent/JPS52130570A/en
Publication of JPS52130570A publication Critical patent/JPS52130570A/en
Publication of JPS5311832B2 publication Critical patent/JPS5311832B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To render very high speed and precision exposure possible by introducing the correction signals as to the position deviation and deflection distortion of an electron beam caused by a converter having a limited number of bits used as the D-A converter for a deflecting device for scanning a large section into a small section deflecting device through the D-A converter for the small section deflecting device.
COPYRIGHT: (C)1977,JPO&Japio
JP4810076A 1976-04-27 1976-04-27 Electron beam exposing device Granted JPS52130570A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4810076A JPS52130570A (en) 1976-04-27 1976-04-27 Electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4810076A JPS52130570A (en) 1976-04-27 1976-04-27 Electron beam exposing device

Publications (2)

Publication Number Publication Date
JPS52130570A true JPS52130570A (en) 1977-11-01
JPS5311832B2 JPS5311832B2 (en) 1978-04-25

Family

ID=12793887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4810076A Granted JPS52130570A (en) 1976-04-27 1976-04-27 Electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS52130570A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54101675A (en) * 1978-01-27 1979-08-10 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam optical lens barrel
JPS55146931A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Depicting method by electronic beam
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS60244024A (en) * 1984-05-18 1985-12-03 Hitachi Ltd Electron beam exposure device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54101675A (en) * 1978-01-27 1979-08-10 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam optical lens barrel
JPS579693B2 (en) * 1978-01-27 1982-02-23
JPS55146931A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Depicting method by electronic beam
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS60244024A (en) * 1984-05-18 1985-12-03 Hitachi Ltd Electron beam exposure device

Also Published As

Publication number Publication date
JPS5311832B2 (en) 1978-04-25

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