JPS52130570A - Electron beam exposing device - Google Patents
Electron beam exposing deviceInfo
- Publication number
- JPS52130570A JPS52130570A JP4810076A JP4810076A JPS52130570A JP S52130570 A JPS52130570 A JP S52130570A JP 4810076 A JP4810076 A JP 4810076A JP 4810076 A JP4810076 A JP 4810076A JP S52130570 A JPS52130570 A JP S52130570A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- converter
- deflecting device
- exposing device
- beam exposing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To render very high speed and precision exposure possible by introducing the correction signals as to the position deviation and deflection distortion of an electron beam caused by a converter having a limited number of bits used as the D-A converter for a deflecting device for scanning a large section into a small section deflecting device through the D-A converter for the small section deflecting device.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4810076A JPS52130570A (en) | 1976-04-27 | 1976-04-27 | Electron beam exposing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4810076A JPS52130570A (en) | 1976-04-27 | 1976-04-27 | Electron beam exposing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52130570A true JPS52130570A (en) | 1977-11-01 |
JPS5311832B2 JPS5311832B2 (en) | 1978-04-25 |
Family
ID=12793887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4810076A Granted JPS52130570A (en) | 1976-04-27 | 1976-04-27 | Electron beam exposing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52130570A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54101675A (en) * | 1978-01-27 | 1979-08-10 | Cho Lsi Gijutsu Kenkyu Kumiai | Electron beam optical lens barrel |
JPS55146931A (en) * | 1979-05-04 | 1980-11-15 | Hitachi Ltd | Depicting method by electronic beam |
JPS5793528A (en) * | 1980-11-28 | 1982-06-10 | Ibm | Electron beam device |
JPS60244024A (en) * | 1984-05-18 | 1985-12-03 | Hitachi Ltd | Electron beam exposure device |
-
1976
- 1976-04-27 JP JP4810076A patent/JPS52130570A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54101675A (en) * | 1978-01-27 | 1979-08-10 | Cho Lsi Gijutsu Kenkyu Kumiai | Electron beam optical lens barrel |
JPS579693B2 (en) * | 1978-01-27 | 1982-02-23 | ||
JPS55146931A (en) * | 1979-05-04 | 1980-11-15 | Hitachi Ltd | Depicting method by electronic beam |
JPS5793528A (en) * | 1980-11-28 | 1982-06-10 | Ibm | Electron beam device |
JPS60244024A (en) * | 1984-05-18 | 1985-12-03 | Hitachi Ltd | Electron beam exposure device |
Also Published As
Publication number | Publication date |
---|---|
JPS5311832B2 (en) | 1978-04-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52151568A (en) | Electron beam exposure apparatus | |
JPS52143776A (en) | Electron beam exposure apparatus | |
JPS53132967A (en) | Da converter | |
JPS52130570A (en) | Electron beam exposing device | |
JPS5322357A (en) | Beam blanking unit | |
JPS53105316A (en) | Pick up unit | |
JPS51148365A (en) | Electron beam exposure method | |
JPS5437685A (en) | Electron beam exposure unit | |
JPS52122083A (en) | Electron beam exposing device | |
JPS51148370A (en) | Electron ray exposure method | |
JPS53126277A (en) | Electron beam exposure apparatus | |
JPS53120277A (en) | Electron beam exposure device | |
JPS52117578A (en) | Electron beam exposing method | |
JPS53117463A (en) | Position detection method | |
JPS5220064A (en) | Zero point adjustment method for digital scale | |
JPS5251873A (en) | Electron beam exposure device | |
JPS5279662A (en) | Electron beam exposure device | |
JPS5360162A (en) | Electron beam irradiation device | |
JPS543476A (en) | Electron beam exposure device | |
JPS5353975A (en) | Electronic beam exposure device | |
JPS52124872A (en) | Electron beam exposure device | |
JPS53101279A (en) | Electron beam exposure device | |
JPS5396676A (en) | Method and apparatus for positioning by electron beam exposure | |
JPS522381A (en) | Electronics beam deflection scanning method | |
JPS56104439A (en) | Electron beam exposing method |