JPS5279662A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS5279662A JPS5279662A JP50154767A JP15476775A JPS5279662A JP S5279662 A JPS5279662 A JP S5279662A JP 50154767 A JP50154767 A JP 50154767A JP 15476775 A JP15476775 A JP 15476775A JP S5279662 A JPS5279662 A JP S5279662A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure device
- beam exposure
- vectro
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To obtain a method of correcting electron beams wherein scanning vectro does not rotate, by controlling a condenser lens.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50154767A JPS5921163B2 (en) | 1975-12-26 | 1975-12-26 | densibee murokosouchi |
US05/675,170 US4063103A (en) | 1975-04-11 | 1976-04-08 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50154767A JPS5921163B2 (en) | 1975-12-26 | 1975-12-26 | densibee murokosouchi |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5279662A true JPS5279662A (en) | 1977-07-04 |
JPS5921163B2 JPS5921163B2 (en) | 1984-05-18 |
Family
ID=15591437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50154767A Expired JPS5921163B2 (en) | 1975-04-11 | 1975-12-26 | densibee murokosouchi |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5921163B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5694739A (en) * | 1979-12-28 | 1981-07-31 | Fujitsu Ltd | Electronic beam exposure method |
JPS5891634A (en) * | 1981-11-26 | 1983-05-31 | Toshiba Corp | Measurement of revolution correction amount of deflection electrode |
-
1975
- 1975-12-26 JP JP50154767A patent/JPS5921163B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5694739A (en) * | 1979-12-28 | 1981-07-31 | Fujitsu Ltd | Electronic beam exposure method |
JPS5891634A (en) * | 1981-11-26 | 1983-05-31 | Toshiba Corp | Measurement of revolution correction amount of deflection electrode |
Also Published As
Publication number | Publication date |
---|---|
JPS5921163B2 (en) | 1984-05-18 |
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