JPS5279662A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5279662A
JPS5279662A JP50154767A JP15476775A JPS5279662A JP S5279662 A JPS5279662 A JP S5279662A JP 50154767 A JP50154767 A JP 50154767A JP 15476775 A JP15476775 A JP 15476775A JP S5279662 A JPS5279662 A JP S5279662A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
vectro
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50154767A
Other languages
Japanese (ja)
Other versions
JPS5921163B2 (en
Inventor
Masahiko Washimi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP50154767A priority Critical patent/JPS5921163B2/en
Priority to US05/675,170 priority patent/US4063103A/en
Publication of JPS5279662A publication Critical patent/JPS5279662A/en
Publication of JPS5921163B2 publication Critical patent/JPS5921163B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a method of correcting electron beams wherein scanning vectro does not rotate, by controlling a condenser lens.
COPYRIGHT: (C)1977,JPO&Japio
JP50154767A 1975-04-11 1975-12-26 densibee murokosouchi Expired JPS5921163B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP50154767A JPS5921163B2 (en) 1975-12-26 1975-12-26 densibee murokosouchi
US05/675,170 US4063103A (en) 1975-04-11 1976-04-08 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50154767A JPS5921163B2 (en) 1975-12-26 1975-12-26 densibee murokosouchi

Publications (2)

Publication Number Publication Date
JPS5279662A true JPS5279662A (en) 1977-07-04
JPS5921163B2 JPS5921163B2 (en) 1984-05-18

Family

ID=15591437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50154767A Expired JPS5921163B2 (en) 1975-04-11 1975-12-26 densibee murokosouchi

Country Status (1)

Country Link
JP (1) JPS5921163B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694739A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Electronic beam exposure method
JPS5891634A (en) * 1981-11-26 1983-05-31 Toshiba Corp Measurement of revolution correction amount of deflection electrode

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694739A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Electronic beam exposure method
JPS5891634A (en) * 1981-11-26 1983-05-31 Toshiba Corp Measurement of revolution correction amount of deflection electrode

Also Published As

Publication number Publication date
JPS5921163B2 (en) 1984-05-18

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