JPS5694739A - Electronic beam exposure method - Google Patents
Electronic beam exposure methodInfo
- Publication number
- JPS5694739A JPS5694739A JP17106479A JP17106479A JPS5694739A JP S5694739 A JPS5694739 A JP S5694739A JP 17106479 A JP17106479 A JP 17106479A JP 17106479 A JP17106479 A JP 17106479A JP S5694739 A JPS5694739 A JP S5694739A
- Authority
- JP
- Japan
- Prior art keywords
- deflecting device
- electrostatic
- electronic
- polariscope
- metallic plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To prevent a deflection accuracy from lowering because of a charged pulluted material sticked to an electrostatic deflecting device by a method wherein a metallic plate having fine holes through which full electronic beams deflected by an electrostatic deflecting device pass is arranged near the electrostatic deflecting device. CONSTITUTION:A variable rectangular electronic beam exposure device is composed of an electron gun 1, an aberration lens 2, rectangular slits 3, 6 an electronic lens 4, an image forming position controlling electrostatic deflecting device 4, a reduction lens 7, a beam open angle limitation throttle valve 8, an objective 9, a positioning electromagnetic polariscope 10, a positioning electrostatic polariscope 11, a glass substrate 12 on which an electronic ray photo sensing resist is applied, an XY stage 13, and a metallic plate provided with fine holes. The metallic plate 20 provided with fine holes is arranged near the electrostatic polariscope and the electronic beam reflected from the apparatus arranged at a lower part is prevented from reaching the deflecting device, thus, the deflection accuracy to the electrostatic deflecting device due to a charge accumulation is prevented from lowering.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17106479A JPS5694739A (en) | 1979-12-28 | 1979-12-28 | Electronic beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17106479A JPS5694739A (en) | 1979-12-28 | 1979-12-28 | Electronic beam exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5694739A true JPS5694739A (en) | 1981-07-31 |
Family
ID=15916378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17106479A Pending JPS5694739A (en) | 1979-12-28 | 1979-12-28 | Electronic beam exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5694739A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5420433A (en) * | 1993-06-24 | 1995-05-30 | Fujitsu Limited | Charged particle beam exposure apparatus |
JP2006210457A (en) * | 2005-01-26 | 2006-08-10 | Canon Inc | Charged beam exposure device |
JP2013168589A (en) * | 2012-02-16 | 2013-08-29 | Nuflare Technology Inc | Electron beam lithography apparatus and electron beam lithography method |
JP2013191841A (en) * | 2012-02-16 | 2013-09-26 | Nuflare Technology Inc | Electron beam lithography apparatus and electron beam lithography method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5279662A (en) * | 1975-12-26 | 1977-07-04 | Toshiba Corp | Electron beam exposure device |
JPS5471992A (en) * | 1977-11-18 | 1979-06-08 | Cho Lsi Gijutsu Kenkyu Kumiai | Electron beam shaping aperture mask |
-
1979
- 1979-12-28 JP JP17106479A patent/JPS5694739A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5279662A (en) * | 1975-12-26 | 1977-07-04 | Toshiba Corp | Electron beam exposure device |
JPS5471992A (en) * | 1977-11-18 | 1979-06-08 | Cho Lsi Gijutsu Kenkyu Kumiai | Electron beam shaping aperture mask |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5420433A (en) * | 1993-06-24 | 1995-05-30 | Fujitsu Limited | Charged particle beam exposure apparatus |
JP2006210457A (en) * | 2005-01-26 | 2006-08-10 | Canon Inc | Charged beam exposure device |
JP4634161B2 (en) * | 2005-01-26 | 2011-02-16 | キヤノン株式会社 | Charged beam exposure apparatus and device manufacturing method |
JP2013168589A (en) * | 2012-02-16 | 2013-08-29 | Nuflare Technology Inc | Electron beam lithography apparatus and electron beam lithography method |
JP2013191841A (en) * | 2012-02-16 | 2013-09-26 | Nuflare Technology Inc | Electron beam lithography apparatus and electron beam lithography method |
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