JPS54119880A - Unit for electron rays - Google Patents

Unit for electron rays

Info

Publication number
JPS54119880A
JPS54119880A JP2678378A JP2678378A JPS54119880A JP S54119880 A JPS54119880 A JP S54119880A JP 2678378 A JP2678378 A JP 2678378A JP 2678378 A JP2678378 A JP 2678378A JP S54119880 A JPS54119880 A JP S54119880A
Authority
JP
Japan
Prior art keywords
lens
deflection
magnetic field
constitution
final stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2678378A
Other languages
Japanese (ja)
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2678378A priority Critical patent/JPS54119880A/en
Publication of JPS54119880A publication Critical patent/JPS54119880A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enable the pattern drawing with high accuracy with a simple constitution, by effectively compensating the revolution error toward deflection due to the magnetic field coil at the final stage with auxiliary lens. CONSTITUTION:The electron rays from the electron gun 1 are shaped via the blanking plate 2, apperture 3, and capacitor 4 and controlled for deflection toward specified direction via the X direction electrostatic deflection plate 5 and the Y direction electrostatic deflection plate 6. Further, the beam is radiated on the test piece 9 mounted on the table 8 via the magnetic field lens at the final stage and focus is formed here. With this constitution, on the upper location near the magnetic field lens 7, the auxiliary lens 11 in which hysteresis is entirely reduced than the lens 7 by taking ferrite core or no core, is newly provided. Further, the exciting current information of the lens 11 is processed for operation with the unit 14 via the interface 13, and the deflection plates 5 and 6 are controlled based on the result, compensating the revolution of the beam deflection angle caused in the lens 7.
JP2678378A 1978-03-09 1978-03-09 Unit for electron rays Pending JPS54119880A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2678378A JPS54119880A (en) 1978-03-09 1978-03-09 Unit for electron rays

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2678378A JPS54119880A (en) 1978-03-09 1978-03-09 Unit for electron rays

Publications (1)

Publication Number Publication Date
JPS54119880A true JPS54119880A (en) 1979-09-18

Family

ID=12202902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2678378A Pending JPS54119880A (en) 1978-03-09 1978-03-09 Unit for electron rays

Country Status (1)

Country Link
JP (1) JPS54119880A (en)

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