JPS5515219A - Electronic beam exposure device - Google Patents

Electronic beam exposure device

Info

Publication number
JPS5515219A
JPS5515219A JP8786578A JP8786578A JPS5515219A JP S5515219 A JPS5515219 A JP S5515219A JP 8786578 A JP8786578 A JP 8786578A JP 8786578 A JP8786578 A JP 8786578A JP S5515219 A JPS5515219 A JP S5515219A
Authority
JP
Japan
Prior art keywords
axis
electronic beam
blanking
scan
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8786578A
Other languages
Japanese (ja)
Inventor
Katsumi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP8786578A priority Critical patent/JPS5515219A/en
Publication of JPS5515219A publication Critical patent/JPS5515219A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path

Abstract

PURPOSE:To scan a pattern at a high speed with a dimension accuracy of dimension by providing a timing adjusting means for commencement of an electronic beam scan indepemdently and respectively in accordance with an electromagnetic deflection coil corresponding to a X-axis and Y axis. CONSTITUTION:A signal for electronic beams is emmitted from a computer and a hard wear pattern generator 4, and travels to a deflection coil 7 for X axis and a deflection coil 10 for Y axis through a D/A converter 5 for X axis and a D/A converter 8 for Y axis and amplifiers 6 and 9. In a circuit concerning a blanking of an electronic beam, also an independent blanking signal for X axis and Y axis is emitted from a pattern generator 4, this signal travels to an antenna 13 through a blanking signal delay circuit 11 and 12 for X axis and Y axis to be introduced to a blanking plate 14. Whereby the difference in the timings which begins to be deflected to the X axis or a Y axis due to a diferent reactance in the X and Y axis deflection coils can be corrected and it is possible to scan the electronic beam with a high accuracy and a high speed.
JP8786578A 1978-07-18 1978-07-18 Electronic beam exposure device Pending JPS5515219A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8786578A JPS5515219A (en) 1978-07-18 1978-07-18 Electronic beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8786578A JPS5515219A (en) 1978-07-18 1978-07-18 Electronic beam exposure device

Publications (1)

Publication Number Publication Date
JPS5515219A true JPS5515219A (en) 1980-02-02

Family

ID=13926765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8786578A Pending JPS5515219A (en) 1978-07-18 1978-07-18 Electronic beam exposure device

Country Status (1)

Country Link
JP (1) JPS5515219A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753938A (en) * 1980-09-17 1982-03-31 Toshiba Corp Electron beam exposure apparatus
JPH0789510B2 (en) * 1984-11-30 1995-09-27 バクスター，インターナショナル，インコ−ポレイテツド Heater / balance and method for heating a fluid to a predetermined temperature
JP2009088202A (en) * 2007-09-28 2009-04-23 Nuflare Technology Inc Charged-particle beam writing apparatus and charged-particle beam writing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320773A (en) * 1976-08-10 1978-02-25 Nippon Telegr & Teleph Corp <Ntt> Electron beam scanning apparatus and its scanning method
JPS54160176A (en) * 1978-06-09 1979-12-18 Toshiba Corp Electron beam exposure device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320773A (en) * 1976-08-10 1978-02-25 Nippon Telegr & Teleph Corp <Ntt> Electron beam scanning apparatus and its scanning method
JPS54160176A (en) * 1978-06-09 1979-12-18 Toshiba Corp Electron beam exposure device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753938A (en) * 1980-09-17 1982-03-31 Toshiba Corp Electron beam exposure apparatus
JPS631743B2 (en) * 1980-09-17 1988-01-13 Tokyo Shibaura Electric Co
JPH0789510B2 (en) * 1984-11-30 1995-09-27 バクスター，インターナショナル，インコ−ポレイテツド Heater / balance and method for heating a fluid to a predetermined temperature
JP2009088202A (en) * 2007-09-28 2009-04-23 Nuflare Technology Inc Charged-particle beam writing apparatus and charged-particle beam writing method

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