JPS5320773A - Electron beam scanning apparatus and its scanning method - Google Patents

Electron beam scanning apparatus and its scanning method

Info

Publication number
JPS5320773A
JPS5320773A JP9448776A JP9448776A JPS5320773A JP S5320773 A JPS5320773 A JP S5320773A JP 9448776 A JP9448776 A JP 9448776A JP 9448776 A JP9448776 A JP 9448776A JP S5320773 A JPS5320773 A JP S5320773A
Authority
JP
Japan
Prior art keywords
electron beam
scanning
linearity
regions
beam scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9448776A
Other languages
Japanese (ja)
Other versions
JPS5324790B2 (en
Inventor
Akinori Shibayama
Akihira Fujinami
Atsushi Iwata
Taido Uno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9448776A priority Critical patent/JPS5320773A/en
Publication of JPS5320773A publication Critical patent/JPS5320773A/en
Publication of JPS5324790B2 publication Critical patent/JPS5324790B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To make scanning speed constant and obtain exposure patterns of uniform line widths and a high quality by cutting off an electron beam in the regions where the linearity by the frequency characteristics of the amplifier used for an integrator are inferior, and carrying scanning exposure in the regions where the linearity are high.
COPYRIGHT: (C)1978,JPO&Japio
JP9448776A 1976-08-10 1976-08-10 Electron beam scanning apparatus and its scanning method Granted JPS5320773A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9448776A JPS5320773A (en) 1976-08-10 1976-08-10 Electron beam scanning apparatus and its scanning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9448776A JPS5320773A (en) 1976-08-10 1976-08-10 Electron beam scanning apparatus and its scanning method

Publications (2)

Publication Number Publication Date
JPS5320773A true JPS5320773A (en) 1978-02-25
JPS5324790B2 JPS5324790B2 (en) 1978-07-22

Family

ID=14111637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9448776A Granted JPS5320773A (en) 1976-08-10 1976-08-10 Electron beam scanning apparatus and its scanning method

Country Status (1)

Country Link
JP (1) JPS5320773A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5515219A (en) * 1978-07-18 1980-02-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Electronic beam exposure device
JP2009088202A (en) * 2007-09-28 2009-04-23 Nuflare Technology Inc Charged-particle beam writing apparatus and charged-particle beam writing method
US11732340B2 (en) 2018-07-31 2023-08-22 Jfe Steel Corporation High-strength hot-rolled coated steel sheet

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5515219A (en) * 1978-07-18 1980-02-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Electronic beam exposure device
JP2009088202A (en) * 2007-09-28 2009-04-23 Nuflare Technology Inc Charged-particle beam writing apparatus and charged-particle beam writing method
US11732340B2 (en) 2018-07-31 2023-08-22 Jfe Steel Corporation High-strength hot-rolled coated steel sheet

Also Published As

Publication number Publication date
JPS5324790B2 (en) 1978-07-22

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