JPS5580321A - Electron-beam exposure - Google Patents
Electron-beam exposureInfo
- Publication number
- JPS5580321A JPS5580321A JP15404078A JP15404078A JPS5580321A JP S5580321 A JPS5580321 A JP S5580321A JP 15404078 A JP15404078 A JP 15404078A JP 15404078 A JP15404078 A JP 15404078A JP S5580321 A JPS5580321 A JP S5580321A
- Authority
- JP
- Japan
- Prior art keywords
- equation
- deflection
- alm
- distortion
- divided
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To perform exact exposure by measuring deflection distortion data at a plurality of sections in the deflection region in an electron-beam system, obtaining a functional equation of the amount of deflection distortion by a least square method, and controlling beam deflection at the center and outer portions of the deflection region by said equation.
CONSTITUTION: When an electron beam is illuminated on a material under treatment, the deflection distortion is very small at the center P of an exposed portion 2 and relatively large over the outer portion Q. Therefore, the exposed portion 2 is divided into small sections in the outer portion, and large sections in the central portion. The one side of the exposed portion 2 is divided into P00WP08, and the other side is divided into P00WP08, and the distances betwern the lines are specified as 1,2,4,2 and 1, from P00WP08 and P00WP80. The amount of distortion of each section is represented by 2-variable third-order polynominal equation (1). δ is obtained by using a least-squaure method shown by an equation (2) in order to determine the coefficient alm in the equation (1). Then, partial differential is performed about alm to determine the value of alm, and it is substituted into the equation (1). thereafter, the deflection is controlled by using said equation (1).
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53154040A JPS5928981B2 (en) | 1978-12-11 | 1978-12-11 | Electron beam exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53154040A JPS5928981B2 (en) | 1978-12-11 | 1978-12-11 | Electron beam exposure method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5580321A true JPS5580321A (en) | 1980-06-17 |
| JPS5928981B2 JPS5928981B2 (en) | 1984-07-17 |
Family
ID=15575594
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53154040A Expired JPS5928981B2 (en) | 1978-12-11 | 1978-12-11 | Electron beam exposure method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5928981B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5750432A (en) * | 1980-09-12 | 1982-03-24 | Jeol Ltd | Drawing method by electron beam |
| JP2015179735A (en) * | 2014-03-19 | 2015-10-08 | 株式会社ニューフレアテクノロジー | Drift correction method of electric charge particle beam and electric charge particle beam drawing device |
| JP2016225357A (en) * | 2015-05-27 | 2016-12-28 | 株式会社ニューフレアテクノロジー | Multi-charged particle beam drawing apparatus and multi-charged particle beam drawing method |
-
1978
- 1978-12-11 JP JP53154040A patent/JPS5928981B2/en not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5750432A (en) * | 1980-09-12 | 1982-03-24 | Jeol Ltd | Drawing method by electron beam |
| JPS631742B2 (en) * | 1980-09-12 | 1988-01-13 | Nippon Electron Optics Lab | |
| JP2015179735A (en) * | 2014-03-19 | 2015-10-08 | 株式会社ニューフレアテクノロジー | Drift correction method of electric charge particle beam and electric charge particle beam drawing device |
| JP2016225357A (en) * | 2015-05-27 | 2016-12-28 | 株式会社ニューフレアテクノロジー | Multi-charged particle beam drawing apparatus and multi-charged particle beam drawing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5928981B2 (en) | 1984-07-17 |
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