JPS5332677A - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatusInfo
- Publication number
- JPS5332677A JPS5332677A JP10663676A JP10663676A JPS5332677A JP S5332677 A JPS5332677 A JP S5332677A JP 10663676 A JP10663676 A JP 10663676A JP 10663676 A JP10663676 A JP 10663676A JP S5332677 A JPS5332677 A JP S5332677A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure apparatus
- beam exposure
- exposure
- covering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To perform desired exposure satisfactorily by covering the exposure room surfaces opposing to the exposed surface of a sample with Al, Si or the like.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10663676A JPS5332677A (en) | 1976-09-08 | 1976-09-08 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10663676A JPS5332677A (en) | 1976-09-08 | 1976-09-08 | Electron beam exposure apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5332677A true JPS5332677A (en) | 1978-03-28 |
Family
ID=14438591
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10663676A Pending JPS5332677A (en) | 1976-09-08 | 1976-09-08 | Electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5332677A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5835921A (en) * | 1981-08-28 | 1983-03-02 | Toshiba Corp | Electron beam drawing device |
JPS58130522A (en) * | 1982-01-28 | 1983-08-04 | Toshiba Corp | Electron beam exposure device |
JPS58223323A (en) * | 1982-06-22 | 1983-12-24 | Toshiba Corp | Electron-beam drawing device |
JPH05258668A (en) * | 1992-01-27 | 1993-10-08 | Thomson Consumer Electron Inc | Method for electrophotographically forming light emitting screen structure on inner surface of crt face plate panel |
-
1976
- 1976-09-08 JP JP10663676A patent/JPS5332677A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5835921A (en) * | 1981-08-28 | 1983-03-02 | Toshiba Corp | Electron beam drawing device |
JPS58130522A (en) * | 1982-01-28 | 1983-08-04 | Toshiba Corp | Electron beam exposure device |
JPS58223323A (en) * | 1982-06-22 | 1983-12-24 | Toshiba Corp | Electron-beam drawing device |
JPH0415609B2 (en) * | 1982-06-22 | 1992-03-18 | Tokyo Shibaura Electric Co | |
JPH05258668A (en) * | 1992-01-27 | 1993-10-08 | Thomson Consumer Electron Inc | Method for electrophotographically forming light emitting screen structure on inner surface of crt face plate panel |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS53105477A (en) | 7-glycylprolylamono-4-methylcoumarine | |
JPS52112632A (en) | Thermosetting resinous composition for coating | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5332677A (en) | Electron beam exposure apparatus | |
JPS52111942A (en) | Equipment for applying paint | |
JPS53116077A (en) | Etching method | |
JPS51122682A (en) | Process for producing water repellent | |
JPS53105316A (en) | Pick up unit | |
JPS53110842A (en) | Fixing roller | |
JPS5226489A (en) | Arc-proofing insulated rod | |
JPS5216171A (en) | Mask fitting device | |
JPS5222473A (en) | Panel measuring device | |
JPS5367694A (en) | Surface modifying method for inorganic porous material | |
JPS5357763A (en) | Diaphragm of electron beam exposure apparatus | |
JPS5223581A (en) | Antifreeze composition and production process for same | |
JPS53108974A (en) | 7-arginylamino-4-methylcoumarin | |
JPS52120761A (en) | Exposure unit | |
JPS5434683A (en) | Sample fine-shifting device for electron beam exposure device or the like | |
JPS53129963A (en) | Wafer appearance inspection apparatus | |
JPS51114431A (en) | Aqueous coating compositions | |
JPS5376668A (en) | X-ray exposure method | |
JPS5291880A (en) | 3-acyl-5-fluorouracil | |
JPS53101279A (en) | Electron beam exposure device | |
JPS5434172A (en) | Electromagnetic-shielding dust-proof constant-temperature chamber | |
JPS52119184A (en) | Electron beam exposing method |