JPS5461880A - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatusInfo
- Publication number
- JPS5461880A JPS5461880A JP12898277A JP12898277A JPS5461880A JP S5461880 A JPS5461880 A JP S5461880A JP 12898277 A JP12898277 A JP 12898277A JP 12898277 A JP12898277 A JP 12898277A JP S5461880 A JPS5461880 A JP S5461880A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- beams
- aperture
- radiation
- deflector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To impart beam intensity of plural times to exposure pattern regions and improve shape accuracy by synthesizing a radiation electron beam with plural electron guns and making the synthesized distribution higher in the portions corresponding to the peripheral edge parts of the exposure pattern and lower in the central part.
CONSTITUTION: Electron guns are provided in plurality, such as 111 and 112, in which Wehnelts W are made separate and the focusing lens 2 and deflector 3 below anode A are made common to synthesize both beams, by which the specified point on the first aperture 4 is radiated. At this time, the synthesis timing of the electron beams may be subsequent or synchronized but in the subsequent radiation, the electron gun 111 is driven first and the beam is high speed vibrated with the deflector 3, then when the beam comes to the edge part of the pattern, the next electron gun 112 is driven and the beams are synthesized at the edge part. At the time of synchronous radiation, the respective beams from the electron guns 11, and 112 are vibrated within the range shown by Q, R. In this way, the X2 end is further difined by the aperture 7 with respect to the X1 end defined by the aperture 4.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12898277A JPS5461880A (en) | 1977-10-27 | 1977-10-27 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12898277A JPS5461880A (en) | 1977-10-27 | 1977-10-27 | Electron beam exposure apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5461880A true JPS5461880A (en) | 1979-05-18 |
Family
ID=14998188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12898277A Pending JPS5461880A (en) | 1977-10-27 | 1977-10-27 | Electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5461880A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08264411A (en) * | 1995-03-20 | 1996-10-11 | Toshiba Corp | Electron beam exposure apparatus and proximity effect correcting method in electron beam exposure |
JP2003109900A (en) * | 2002-09-02 | 2003-04-11 | Toshiba Corp | Near field effect correction method in electron beam exposure |
-
1977
- 1977-10-27 JP JP12898277A patent/JPS5461880A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08264411A (en) * | 1995-03-20 | 1996-10-11 | Toshiba Corp | Electron beam exposure apparatus and proximity effect correcting method in electron beam exposure |
JP2003109900A (en) * | 2002-09-02 | 2003-04-11 | Toshiba Corp | Near field effect correction method in electron beam exposure |
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