JPS5354480A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS5354480A
JPS5354480A JP12877476A JP12877476A JPS5354480A JP S5354480 A JPS5354480 A JP S5354480A JP 12877476 A JP12877476 A JP 12877476A JP 12877476 A JP12877476 A JP 12877476A JP S5354480 A JPS5354480 A JP S5354480A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
high frequency
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12877476A
Other languages
Japanese (ja)
Other versions
JPS5846849B2 (en
Inventor
Masanao Itoga
Hiroshi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP51128774A priority Critical patent/JPS5846849B2/en
Publication of JPS5354480A publication Critical patent/JPS5354480A/en
Publication of JPS5846849B2 publication Critical patent/JPS5846849B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To unify a passing electron beam by providing a high frequency deflector above the uppermost stage slit of the plural slits shaping the electron beam from an electron gun by allowing the beam to pass therethrough and applying high frequency voltage thereto.
COPYRIGHT: (C)1978,JPO&Japio
JP51128774A 1976-10-28 1976-10-28 Electron beam exposure equipment Expired JPS5846849B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51128774A JPS5846849B2 (en) 1976-10-28 1976-10-28 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51128774A JPS5846849B2 (en) 1976-10-28 1976-10-28 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS5354480A true JPS5354480A (en) 1978-05-17
JPS5846849B2 JPS5846849B2 (en) 1983-10-19

Family

ID=14993126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51128774A Expired JPS5846849B2 (en) 1976-10-28 1976-10-28 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5846849B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115879A (en) * 1985-11-15 1987-05-27 Sony Corp Manufacture of junction field effect transistor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5881354U (en) * 1981-11-30 1983-06-02 スズキ株式会社 carburetor starting device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115879A (en) * 1985-11-15 1987-05-27 Sony Corp Manufacture of junction field effect transistor

Also Published As

Publication number Publication date
JPS5846849B2 (en) 1983-10-19

Similar Documents

Publication Publication Date Title
JPS52151568A (en) Electron beam exposure apparatus
JPS52143776A (en) Electron beam exposure apparatus
JPS5354480A (en) Electron beam exposure apparatus
JPS5322357A (en) Beam blanking unit
JPS5333689A (en) Composite ion source for mass spectrometer
JPS5229164A (en) Electron gun body and its method of production
JPS5265783A (en) Equipment for evaporation by electron beam
JPS52130570A (en) Electron beam exposing device
JPS5228684A (en) Electron beam radiation method onto coated wire
JPS5219070A (en) Distribution method
JPS5230277A (en) Fluorescent substance for low speed electron beam
JPS52103966A (en) Deflection unit for charged particle ray exposure device
JPS52119179A (en) Electron beam exposing method
JPS5783030A (en) Exposure of electron beam
JPS52117578A (en) Electron beam exposing method
JPS52115161A (en) Electron gun for electron beam exposing device
JPS53145476A (en) Electron beam exposure apparatus
JPS5230150A (en) Manufacturing system of electron radiation cathode rod
JPS51135322A (en) Electron beam adjusting magneto of braun tube
JPS5357764A (en) Electron beam exposure apparatus
JPS53114676A (en) Electron beam exposure method
JPS5218748A (en) Method and apparatus for the recovery of solvent vapor emitted by dip coating
JPS52119079A (en) Electron beam exposure
JPS52127089A (en) X-ray tube
JPS5339078A (en) Electron beam exposure method