JPS5454581A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS5454581A
JPS5454581A JP12170277A JP12170277A JPS5454581A JP S5454581 A JPS5454581 A JP S5454581A JP 12170277 A JP12170277 A JP 12170277A JP 12170277 A JP12170277 A JP 12170277A JP S5454581 A JPS5454581 A JP S5454581A
Authority
JP
Japan
Prior art keywords
aperture
plate
rectangular
electron beam
aperture plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12170277A
Other languages
Japanese (ja)
Inventor
Yasuo Furukawa
Masahiro Okabe
Akio Ito
Toshihiro Ishizuka
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12170277A priority Critical patent/JPS5454581A/en
Publication of JPS5454581A publication Critical patent/JPS5454581A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain rectangular beams of an arbitrary shape and change scanning speed as well by providing a rectangular slit on the first aperture plate on the incident side of an electron beam and deflecting the electron beam passed therethrough with subsequent aperture plates.
CONSTITUTION: Electron beam from an electron gun is accelerated with a grid G and an anode A and is focused with a condenser lens 2, thence it is passed through the aperture 11 of a first aperture plate 3, whereby it is made to a rectangular beam. Next, this beam is passed through a condenser lens 3 and a deflector 12, and is imaged on a second aperture plate 8. At this time, the image formed of the rectangular beam 15 and the aperture 9 of the plate 8 are superposed and the image on the plate 8 is scanned. With such constitution, the aperture 11 provided on the first aperture plate 3 is made in slit form, then the pattern 14 scanned the image 13 on the second aperture plate 8 is partly restricted, becoming the desired rectangular beam for exposure
COPYRIGHT: (C)1979,JPO&Japio
JP12170277A 1977-10-11 1977-10-11 Electron beam exposure apparatus Pending JPS5454581A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12170277A JPS5454581A (en) 1977-10-11 1977-10-11 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12170277A JPS5454581A (en) 1977-10-11 1977-10-11 Electron beam exposure apparatus

Publications (1)

Publication Number Publication Date
JPS5454581A true JPS5454581A (en) 1979-04-28

Family

ID=14817754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12170277A Pending JPS5454581A (en) 1977-10-11 1977-10-11 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5454581A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5610926A (en) * 1979-07-06 1981-02-03 Hitachi Ltd Electron beam drawing device
JPS56103423A (en) * 1979-12-17 1981-08-18 Western Electric Co Charged particle beam high speed scanner

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5610926A (en) * 1979-07-06 1981-02-03 Hitachi Ltd Electron beam drawing device
JPS6161251B2 (en) * 1979-07-06 1986-12-24 Hitachi Ltd
JPS56103423A (en) * 1979-12-17 1981-08-18 Western Electric Co Charged particle beam high speed scanner
JPH0316775B2 (en) * 1979-12-17 1991-03-06 Ei Teii Ando Teii Tekunorojiizu Inc

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