JPS5454581A - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatusInfo
- Publication number
- JPS5454581A JPS5454581A JP12170277A JP12170277A JPS5454581A JP S5454581 A JPS5454581 A JP S5454581A JP 12170277 A JP12170277 A JP 12170277A JP 12170277 A JP12170277 A JP 12170277A JP S5454581 A JPS5454581 A JP S5454581A
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- plate
- rectangular
- electron beam
- aperture plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To obtain rectangular beams of an arbitrary shape and change scanning speed as well by providing a rectangular slit on the first aperture plate on the incident side of an electron beam and deflecting the electron beam passed therethrough with subsequent aperture plates.
CONSTITUTION: Electron beam from an electron gun is accelerated with a grid G and an anode A and is focused with a condenser lens 2, thence it is passed through the aperture 11 of a first aperture plate 3, whereby it is made to a rectangular beam. Next, this beam is passed through a condenser lens 3 and a deflector 12, and is imaged on a second aperture plate 8. At this time, the image formed of the rectangular beam 15 and the aperture 9 of the plate 8 are superposed and the image on the plate 8 is scanned. With such constitution, the aperture 11 provided on the first aperture plate 3 is made in slit form, then the pattern 14 scanned the image 13 on the second aperture plate 8 is partly restricted, becoming the desired rectangular beam for exposure
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12170277A JPS5454581A (en) | 1977-10-11 | 1977-10-11 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12170277A JPS5454581A (en) | 1977-10-11 | 1977-10-11 | Electron beam exposure apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5454581A true JPS5454581A (en) | 1979-04-28 |
Family
ID=14817754
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12170277A Pending JPS5454581A (en) | 1977-10-11 | 1977-10-11 | Electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5454581A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5610926A (en) * | 1979-07-06 | 1981-02-03 | Hitachi Ltd | Electron beam drawing device |
JPS56103423A (en) * | 1979-12-17 | 1981-08-18 | Western Electric Co | Charged particle beam high speed scanner |
-
1977
- 1977-10-11 JP JP12170277A patent/JPS5454581A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5610926A (en) * | 1979-07-06 | 1981-02-03 | Hitachi Ltd | Electron beam drawing device |
JPS6161251B2 (en) * | 1979-07-06 | 1986-12-24 | Hitachi Ltd | |
JPS56103423A (en) * | 1979-12-17 | 1981-08-18 | Western Electric Co | Charged particle beam high speed scanner |
JPH0316775B2 (en) * | 1979-12-17 | 1991-03-06 | Ei Teii Ando Teii Tekunorojiizu Inc |
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