JPS6415604A - Measuring apparatus for length by electron beam - Google Patents

Measuring apparatus for length by electron beam

Info

Publication number
JPS6415604A
JPS6415604A JP17217687A JP17217687A JPS6415604A JP S6415604 A JPS6415604 A JP S6415604A JP 17217687 A JP17217687 A JP 17217687A JP 17217687 A JP17217687 A JP 17217687A JP S6415604 A JPS6415604 A JP S6415604A
Authority
JP
Japan
Prior art keywords
reduced
electron
wafer
projected
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17217687A
Other languages
Japanese (ja)
Inventor
Hiroshi Nozue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP17217687A priority Critical patent/JPS6415604A/en
Publication of JPS6415604A publication Critical patent/JPS6415604A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To lessen the number of times of repeated scanning for measuring dimensions, by providing an apparatus with a function whereby an image formed by uniform irradiation of a rectangular aperture with electron beams is focused and projected on a pattern. CONSTITUTION:A rectangular aperture 102 is irradiated uniformly by electron beams 117 emitted from an electron gun element 101, and an image formed by the rectangular aperture 102 is reduced by a reducing lens 104. After passing through a restricting aperture 105, it is reduced further and projected on a wafer 109 by means of a reducing lens 106 and a projecting lens 107. A rectangular electron beam reduced and projected on the wafer 109 is made to scan the wafer by a scanning deflection electrode provided in the projecting lens 107. Secondary electrons generated thereby from an irradiated part are caught and collected by a scintillator 118, and secondary electron signals thus obtained are processed by a control element 115, so that dimensions can be determined. By this construction, the number of times of repeated scanning for measuring the dimensions is lessened and electron beam damage to a device is reduced.
JP17217687A 1987-07-10 1987-07-10 Measuring apparatus for length by electron beam Pending JPS6415604A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17217687A JPS6415604A (en) 1987-07-10 1987-07-10 Measuring apparatus for length by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17217687A JPS6415604A (en) 1987-07-10 1987-07-10 Measuring apparatus for length by electron beam

Publications (1)

Publication Number Publication Date
JPS6415604A true JPS6415604A (en) 1989-01-19

Family

ID=15936983

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17217687A Pending JPS6415604A (en) 1987-07-10 1987-07-10 Measuring apparatus for length by electron beam

Country Status (1)

Country Link
JP (1) JPS6415604A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0458104A (en) * 1990-06-27 1992-02-25 Hitachi Ltd Electron beam size measuring instrument
US5246992A (en) * 1989-09-15 1993-09-21 Hoechst Aktiengesellschaft Polyester fibers modified with carbodiimides and process for their preparation
US5378537A (en) * 1990-10-19 1995-01-03 Toray Industries, Inc. Polyester monofilament
US6147128A (en) * 1998-05-14 2000-11-14 Astenjohnson, Inc. Industrial fabric and yarn made from recycled polyester

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041456A (en) * 1983-08-12 1985-03-05 Takai Seisakusho:Kk Preparation of silk-strained bean curd filled in cup
JPS6222010A (en) * 1985-07-23 1987-01-30 Mitsubishi Electric Corp Detecting method for pattern defect

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041456A (en) * 1983-08-12 1985-03-05 Takai Seisakusho:Kk Preparation of silk-strained bean curd filled in cup
JPS6222010A (en) * 1985-07-23 1987-01-30 Mitsubishi Electric Corp Detecting method for pattern defect

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5246992A (en) * 1989-09-15 1993-09-21 Hoechst Aktiengesellschaft Polyester fibers modified with carbodiimides and process for their preparation
JPH0458104A (en) * 1990-06-27 1992-02-25 Hitachi Ltd Electron beam size measuring instrument
US5378537A (en) * 1990-10-19 1995-01-03 Toray Industries, Inc. Polyester monofilament
US6147128A (en) * 1998-05-14 2000-11-14 Astenjohnson, Inc. Industrial fabric and yarn made from recycled polyester

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