JPS556829A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS556829A
JPS556829A JP7892878A JP7892878A JPS556829A JP S556829 A JPS556829 A JP S556829A JP 7892878 A JP7892878 A JP 7892878A JP 7892878 A JP7892878 A JP 7892878A JP S556829 A JPS556829 A JP S556829A
Authority
JP
Japan
Prior art keywords
electron beam
slit
converter
passing
results
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7892878A
Other languages
Japanese (ja)
Inventor
Toshihiko Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7892878A priority Critical patent/JPS556829A/en
Publication of JPS556829A publication Critical patent/JPS556829A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To ensure stable exposure constantly through control of the electron beam according to the results of the measurement thereof with the second slit when it passing through the first slit. CONSTITUTION:Electron beam emitted from the electron gun 1 is received by the second rectangular slit 5 after passing through the first rectangular slit 3 and a deflector 4. Current developed here is sent to a central processing unit 11 through a preamplifier 9 and an A-D converter 10, where it is compared with the preset value of the electron beam. The results are fedback to a heater transformer 7 through a D- A converter 81 to control the heater current. An alignment coil 2 corrects the electron beam if any abnormalty is found in the current density distribution, thereby dissolving the horizontal drift associated with the aging of the cathode section.
JP7892878A 1978-06-29 1978-06-29 Electron beam exposure method Pending JPS556829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7892878A JPS556829A (en) 1978-06-29 1978-06-29 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7892878A JPS556829A (en) 1978-06-29 1978-06-29 Electron beam exposure method

Publications (1)

Publication Number Publication Date
JPS556829A true JPS556829A (en) 1980-01-18

Family

ID=13675522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7892878A Pending JPS556829A (en) 1978-06-29 1978-06-29 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS556829A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133825A (en) * 1980-03-21 1981-10-20 Toshiba Corp Electron beam device
JPS57207339A (en) * 1981-06-16 1982-12-20 Fujitsu Ltd Electron beam exposure device
JPS5856418A (en) * 1981-09-30 1983-04-04 Fujitsu Ltd Electron beam exposure apparatus
JPS6354581A (en) * 1986-08-21 1988-03-08 金子農機株式会社 Cereal drier
JP2009010078A (en) * 2007-06-27 2009-01-15 Nuflare Technology Inc Electron beam drawing device and current density adjustment method for electron beam

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133825A (en) * 1980-03-21 1981-10-20 Toshiba Corp Electron beam device
JPH0450732B2 (en) * 1980-03-21 1992-08-17 Tokyo Shibaura Electric Co
JPS57207339A (en) * 1981-06-16 1982-12-20 Fujitsu Ltd Electron beam exposure device
JPS5856418A (en) * 1981-09-30 1983-04-04 Fujitsu Ltd Electron beam exposure apparatus
JPS6354581A (en) * 1986-08-21 1988-03-08 金子農機株式会社 Cereal drier
JPH0527024B2 (en) * 1986-08-21 1993-04-19 Kaneko Agricult Machinery
JP2009010078A (en) * 2007-06-27 2009-01-15 Nuflare Technology Inc Electron beam drawing device and current density adjustment method for electron beam
JP4676461B2 (en) * 2007-06-27 2011-04-27 株式会社ニューフレアテクノロジー Electron beam drawing apparatus and electron beam current density adjusting method

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