JPS5760842A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS5760842A JPS5760842A JP13659580A JP13659580A JPS5760842A JP S5760842 A JPS5760842 A JP S5760842A JP 13659580 A JP13659580 A JP 13659580A JP 13659580 A JP13659580 A JP 13659580A JP S5760842 A JPS5760842 A JP S5760842A
- Authority
- JP
- Japan
- Prior art keywords
- theta
- deflector
- parallel
- slipping
- widths
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Abstract
PURPOSE:To adjust the parallel in a short time automatically with high accuracy, by detecting parallel slipping between two aperture masks and a beam formation deflector on various conditions of a beam dimension. CONSTITUTION:A beam dimension is meaausred with fine particle 9b with high emission of reflected electron provided for a target 9. An X-deflector 3a is given constant voltage Vx. A Y-deflector 3b is scanned with beam in X-direction on two conditions, for example, of widths 4mum and 1mum. And beam widths Lx(4) and Lx(1) are measured. The parallel slipping theta will be obtained by theta=Lx(4)-Lx(1)/4-1, if the deflectors 3a and 3b are correct in perpendicular accuracy. Each deflector is given each voltage of Vx'=Vx+VyQ and Vy'=Vy-Vx, while a circuit 6 converts the values of theta(theta<<1) for the coordinates. And the slipping is corrected. This enables parallel correction in a short time with high accuracy.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13659580A JPS5760842A (en) | 1980-09-30 | 1980-09-30 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13659580A JPS5760842A (en) | 1980-09-30 | 1980-09-30 | Electron beam exposure device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5760842A true JPS5760842A (en) | 1982-04-13 |
JPS6313337B2 JPS6313337B2 (en) | 1988-03-25 |
Family
ID=15178965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13659580A Granted JPS5760842A (en) | 1980-09-30 | 1980-09-30 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5760842A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6221901A (en) * | 1985-07-18 | 1987-01-30 | 日本航空株式会社 | Track structure of attraction type magnetic float vehicle |
US4684809A (en) * | 1984-09-29 | 1987-08-04 | Kabushiki Kaisha Toshiba | Method of adjusting optical column in energy beam exposure system |
-
1980
- 1980-09-30 JP JP13659580A patent/JPS5760842A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4684809A (en) * | 1984-09-29 | 1987-08-04 | Kabushiki Kaisha Toshiba | Method of adjusting optical column in energy beam exposure system |
JPS6221901A (en) * | 1985-07-18 | 1987-01-30 | 日本航空株式会社 | Track structure of attraction type magnetic float vehicle |
Also Published As
Publication number | Publication date |
---|---|
JPS6313337B2 (en) | 1988-03-25 |
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