JPS5679432A - Electron beam exposure process - Google Patents

Electron beam exposure process

Info

Publication number
JPS5679432A
JPS5679432A JP15708779A JP15708779A JPS5679432A JP S5679432 A JPS5679432 A JP S5679432A JP 15708779 A JP15708779 A JP 15708779A JP 15708779 A JP15708779 A JP 15708779A JP S5679432 A JPS5679432 A JP S5679432A
Authority
JP
Japan
Prior art keywords
electron beam
deflector
measured
control
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15708779A
Other languages
Japanese (ja)
Other versions
JPS5831728B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Nobuo Goto
Tetsuo Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP15708779A priority Critical patent/JPS5831728B2/en
Publication of JPS5679432A publication Critical patent/JPS5679432A/en
Publication of JPS5831728B2 publication Critical patent/JPS5831728B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To get a correct volume of exposure by a method wherein each of the values of the electric currents of an electron beam having a beltlike section parallel with X-axis and of another electron beam having a beltlike section parallel with Y- axis is measured when a figure to be drawn is shot, and an exposure is made in an independent shot time in response to the measured electric current. CONSTITUTION:Electron beam from an electron gun 1 is fed to a beam variable section device 3 through an injecting pump 2, made to be such an electron beam as having a desired shape of section and a size by a projecting lens 8 and a deflector 10, then projected onto the material 9. With this arrangement, a Faraday cup 22 is closely arranged to the material 9, each of the electric currents of the electron beams parallel with X- and Y-axes, respectively, is measured and the output signal is applied to a computer 17. Then, the output from the computer is fed to the rectangular drawing shot time recording registor 13, X- and Y-trapezoid drawing shot time recording registers 14 and 15 to control a blanking circuit 12, and at the same time to control the deflector 7 in the device 3 through DA transducer 18 and the amplifier 19 as well as to control the deflector 10 through DA transducer 20 and the amplifier 21, respectively.
JP15708779A 1979-12-04 1979-12-04 Electron beam exposure method Expired JPS5831728B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15708779A JPS5831728B2 (en) 1979-12-04 1979-12-04 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15708779A JPS5831728B2 (en) 1979-12-04 1979-12-04 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS5679432A true JPS5679432A (en) 1981-06-30
JPS5831728B2 JPS5831728B2 (en) 1983-07-08

Family

ID=15641954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15708779A Expired JPS5831728B2 (en) 1979-12-04 1979-12-04 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5831728B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5739536A (en) * 1980-08-20 1982-03-04 Matsushita Electronics Corp Method of electron beam exposure
JPS593923A (en) * 1982-06-30 1984-01-10 Fujitsu Ltd Electron beam exposing method
JPH01120821A (en) * 1987-11-04 1989-05-12 Jeol Ltd Trapezoid lithography device using variable rectangular charged particle beam

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5739536A (en) * 1980-08-20 1982-03-04 Matsushita Electronics Corp Method of electron beam exposure
JPH0334646B2 (en) * 1980-08-20 1991-05-23 Matsushita Denshi Kogyo Kk
JPS593923A (en) * 1982-06-30 1984-01-10 Fujitsu Ltd Electron beam exposing method
JPH0341974B2 (en) * 1982-06-30 1991-06-25
JPH01120821A (en) * 1987-11-04 1989-05-12 Jeol Ltd Trapezoid lithography device using variable rectangular charged particle beam

Also Published As

Publication number Publication date
JPS5831728B2 (en) 1983-07-08

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