JPS56125833A - Exposing method for electron beam - Google Patents

Exposing method for electron beam

Info

Publication number
JPS56125833A
JPS56125833A JP2869680A JP2869680A JPS56125833A JP S56125833 A JPS56125833 A JP S56125833A JP 2869680 A JP2869680 A JP 2869680A JP 2869680 A JP2869680 A JP 2869680A JP S56125833 A JPS56125833 A JP S56125833A
Authority
JP
Japan
Prior art keywords
electron beam
resist
resist film
section
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2869680A
Other languages
Japanese (ja)
Inventor
Kenji Murakami
Kuniya Shimazaki
Michiro Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP2869680A priority Critical patent/JPS56125833A/en
Publication of JPS56125833A publication Critical patent/JPS56125833A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the electrification at an electron beam scanning section as well as to enable to perform a highly accurate patterning by a method wherein an electron beam sensitive resist film is coated on an insulating material and the resist having conductive property is used when the electron beam is scanned for exposure on the desired part of the resist film. CONSTITUTION:The electron beam sensitive resist having conductive property is applied on the insulating material and an electron beam pattern is drawn by scanning the electron beam on the desired section of the resist film in the earthed state of the resist film. As the conductive resist, there are positive type resist such as polymethyl methacrylate polybuten-1-sulfone and the like whereon conductive fine powder such as carbon or the like is diepersed, and polyglycidyl methacrylate and the like. Through these procedures, the electrification of the electron beam scanning section and the curving of the electron beam of the adjoining section are prevented and a highly accurate resist pattern can be formed.
JP2869680A 1980-03-07 1980-03-07 Exposing method for electron beam Pending JPS56125833A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2869680A JPS56125833A (en) 1980-03-07 1980-03-07 Exposing method for electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2869680A JPS56125833A (en) 1980-03-07 1980-03-07 Exposing method for electron beam

Publications (1)

Publication Number Publication Date
JPS56125833A true JPS56125833A (en) 1981-10-02

Family

ID=12255633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2869680A Pending JPS56125833A (en) 1980-03-07 1980-03-07 Exposing method for electron beam

Country Status (1)

Country Link
JP (1) JPS56125833A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61125019A (en) * 1984-11-16 1986-06-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Manufacture of ic and photoconductive photoresist composite used therefor
JPS63254728A (en) * 1987-04-10 1988-10-21 Matsushita Electronics Corp Forming method for resist pattern
JPS63254729A (en) * 1987-04-10 1988-10-21 Matsushita Electronics Corp Forming method for resist pattern
US5019485A (en) * 1988-10-13 1991-05-28 Fujitsu Limited Process of using an electrically conductive layer-providing composition for formation of resist patterns

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61125019A (en) * 1984-11-16 1986-06-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Manufacture of ic and photoconductive photoresist composite used therefor
JPS63254728A (en) * 1987-04-10 1988-10-21 Matsushita Electronics Corp Forming method for resist pattern
JPS63254729A (en) * 1987-04-10 1988-10-21 Matsushita Electronics Corp Forming method for resist pattern
US5019485A (en) * 1988-10-13 1991-05-28 Fujitsu Limited Process of using an electrically conductive layer-providing composition for formation of resist patterns

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