JPS56114943A - Negative type resist material for electron beam - Google Patents

Negative type resist material for electron beam

Info

Publication number
JPS56114943A
JPS56114943A JP1654080A JP1654080A JPS56114943A JP S56114943 A JPS56114943 A JP S56114943A JP 1654080 A JP1654080 A JP 1654080A JP 1654080 A JP1654080 A JP 1654080A JP S56114943 A JPS56114943 A JP S56114943A
Authority
JP
Japan
Prior art keywords
resist material
film
electron beam
negative type
gma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1654080A
Other languages
Japanese (ja)
Inventor
Yoshio Yamashita
Mitsumasa Kunishi
Takaharu Kawazu
Seigo Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP1654080A priority Critical patent/JPS56114943A/en
Publication of JPS56114943A publication Critical patent/JPS56114943A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To obtain a negative type resist material for an electron beam with high sensitivity, high resolution, superior adhesion and superior heat resistance by using a copolymer consisting of glycidyl methacrylate (GMA) and methyl methacrylate (MMA) in a specified ratio. CONSTITUTION:A copolymer consisting of 30-70mol% GMA and the balance MMA is dissolved in chlorobenzene, and this soln. is applied to a wafer by a spin coating method or other method to form a film of about 1mu thickness. The film is prebaked at 130 deg. for about 30min and irradiated with electron beams to draw a pattern. The nonirradiated part is then removed by development with methyl ethyl ketone or the like to obtain a pattern having an almost perfect rectangular section and slightly generating scum. This resist film has <=0.1mu resolving power and shows superior adhesion, heat resistance and etching resistance. This resist material is most suitable for use in the manufacture of LSI, etc.
JP1654080A 1980-02-15 1980-02-15 Negative type resist material for electron beam Pending JPS56114943A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1654080A JPS56114943A (en) 1980-02-15 1980-02-15 Negative type resist material for electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1654080A JPS56114943A (en) 1980-02-15 1980-02-15 Negative type resist material for electron beam

Publications (1)

Publication Number Publication Date
JPS56114943A true JPS56114943A (en) 1981-09-09

Family

ID=11919091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1654080A Pending JPS56114943A (en) 1980-02-15 1980-02-15 Negative type resist material for electron beam

Country Status (1)

Country Link
JP (1) JPS56114943A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5984519A (en) * 1982-11-08 1984-05-16 Hitachi Ltd Developer
JPS60186509A (en) * 1984-03-07 1985-09-24 Uchiyama Mfg Corp Acrylic rubber composition for sealing material
JPS63295614A (en) * 1987-05-28 1988-12-02 Tokyo Ohka Kogyo Co Ltd Organic glass composition for use in forming color filter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5984519A (en) * 1982-11-08 1984-05-16 Hitachi Ltd Developer
JPS60186509A (en) * 1984-03-07 1985-09-24 Uchiyama Mfg Corp Acrylic rubber composition for sealing material
JPS63295614A (en) * 1987-05-28 1988-12-02 Tokyo Ohka Kogyo Co Ltd Organic glass composition for use in forming color filter

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