JPS55134845A - Electron beam resist - Google Patents

Electron beam resist

Info

Publication number
JPS55134845A
JPS55134845A JP4179079A JP4179079A JPS55134845A JP S55134845 A JPS55134845 A JP S55134845A JP 4179079 A JP4179079 A JP 4179079A JP 4179079 A JP4179079 A JP 4179079A JP S55134845 A JPS55134845 A JP S55134845A
Authority
JP
Japan
Prior art keywords
copolymer
acrylate
electron beam
mask
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4179079A
Other languages
Japanese (ja)
Other versions
JPS6055823B2 (en
Inventor
Takateru Asano
Kiyoshi Sato
Tsutomu Tsujimura
Yoko Matsumoto
Hideo Kuniyoshi
Yoichi Kawarasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Victor Company of Japan Ltd
Panasonic Holdings Corp
Original Assignee
Fuji Yakuhin Kogyo KK
Victor Company of Japan Ltd
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK, Victor Company of Japan Ltd, Matsushita Electric Industrial Co Ltd filed Critical Fuji Yakuhin Kogyo KK
Priority to JP4179079A priority Critical patent/JPS6055823B2/en
Publication of JPS55134845A publication Critical patent/JPS55134845A/en
Publication of JPS6055823B2 publication Critical patent/JPS6055823B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

PURPOSE: To obtain a mask having superior sensitivity and resolving power and suitable for use mainly in manufacture of an integrated circuit by using an electron beam resist based on a copolymer of cyanoethyl acrylate and a specified ratio of cyanomethyl acrylate.
CONSTITUTION: Cyanoethyl acrylate and 0.5W15mol% of cyanomethyl acrylate are copolymerized at about 0°C in cyclohexane and dimethylsulfoxide to form a copolymer with an average MW of 100,000W400,000. This copolymer solution is coated onto a chromium mask substrate, heat treated, scanned with electron beams to draw an image, dipped in a mixed developer or γ-butyrolactone, isopropyl alcohol and water, and washed with isopropanol or the like to form a resist image. The developed substrate is then postbacked and etched, and by removing the resist film a hard mask having high resolving power is obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP4179079A 1979-04-06 1979-04-06 electron beam resist Expired JPS6055823B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4179079A JPS6055823B2 (en) 1979-04-06 1979-04-06 electron beam resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4179079A JPS6055823B2 (en) 1979-04-06 1979-04-06 electron beam resist

Publications (2)

Publication Number Publication Date
JPS55134845A true JPS55134845A (en) 1980-10-21
JPS6055823B2 JPS6055823B2 (en) 1985-12-06

Family

ID=12618127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4179079A Expired JPS6055823B2 (en) 1979-04-06 1979-04-06 electron beam resist

Country Status (1)

Country Link
JP (1) JPS6055823B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63271254A (en) * 1986-12-29 1988-11-09 Toppan Printing Co Ltd Radiation sensitive positive type resist having high resolution
JPS63271251A (en) * 1986-12-29 1988-11-09 Toppan Printing Co Ltd Radiation sensitive resist having high sensitivity and resolution

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63271254A (en) * 1986-12-29 1988-11-09 Toppan Printing Co Ltd Radiation sensitive positive type resist having high resolution
JPS63271251A (en) * 1986-12-29 1988-11-09 Toppan Printing Co Ltd Radiation sensitive resist having high sensitivity and resolution

Also Published As

Publication number Publication date
JPS6055823B2 (en) 1985-12-06

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