JPS55134845A - Electron beam resist - Google Patents
Electron beam resistInfo
- Publication number
- JPS55134845A JPS55134845A JP4179079A JP4179079A JPS55134845A JP S55134845 A JPS55134845 A JP S55134845A JP 4179079 A JP4179079 A JP 4179079A JP 4179079 A JP4179079 A JP 4179079A JP S55134845 A JPS55134845 A JP S55134845A
- Authority
- JP
- Japan
- Prior art keywords
- copolymer
- acrylate
- electron beam
- mask
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
PURPOSE: To obtain a mask having superior sensitivity and resolving power and suitable for use mainly in manufacture of an integrated circuit by using an electron beam resist based on a copolymer of cyanoethyl acrylate and a specified ratio of cyanomethyl acrylate.
CONSTITUTION: Cyanoethyl acrylate and 0.5W15mol% of cyanomethyl acrylate are copolymerized at about 0°C in cyclohexane and dimethylsulfoxide to form a copolymer with an average MW of 100,000W400,000. This copolymer solution is coated onto a chromium mask substrate, heat treated, scanned with electron beams to draw an image, dipped in a mixed developer or γ-butyrolactone, isopropyl alcohol and water, and washed with isopropanol or the like to form a resist image. The developed substrate is then postbacked and etched, and by removing the resist film a hard mask having high resolving power is obtained.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4179079A JPS6055823B2 (en) | 1979-04-06 | 1979-04-06 | electron beam resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4179079A JPS6055823B2 (en) | 1979-04-06 | 1979-04-06 | electron beam resist |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55134845A true JPS55134845A (en) | 1980-10-21 |
JPS6055823B2 JPS6055823B2 (en) | 1985-12-06 |
Family
ID=12618127
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4179079A Expired JPS6055823B2 (en) | 1979-04-06 | 1979-04-06 | electron beam resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6055823B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63271254A (en) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | Radiation sensitive positive type resist having high resolution |
JPS63271251A (en) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | Radiation sensitive resist having high sensitivity and resolution |
-
1979
- 1979-04-06 JP JP4179079A patent/JPS6055823B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63271254A (en) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | Radiation sensitive positive type resist having high resolution |
JPS63271251A (en) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | Radiation sensitive resist having high sensitivity and resolution |
Also Published As
Publication number | Publication date |
---|---|
JPS6055823B2 (en) | 1985-12-06 |
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