JPS5639537A - Ionized radiation sensitive resist - Google Patents

Ionized radiation sensitive resist

Info

Publication number
JPS5639537A
JPS5639537A JP11494979A JP11494979A JPS5639537A JP S5639537 A JPS5639537 A JP S5639537A JP 11494979 A JP11494979 A JP 11494979A JP 11494979 A JP11494979 A JP 11494979A JP S5639537 A JPS5639537 A JP S5639537A
Authority
JP
Japan
Prior art keywords
resist
methacrylate
radiation sensitive
copolymer
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11494979A
Other languages
Japanese (ja)
Other versions
JPS5719409B2 (en
Inventor
Hirohisa Kato
Tsukasa Tada
Takamaro Mizoguchi
Masanobu Koda
Yuzo Shimazaki
Hideo Saeki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP11494979A priority Critical patent/JPS5639537A/en
Publication of JPS5639537A publication Critical patent/JPS5639537A/en
Publication of JPS5719409B2 publication Critical patent/JPS5719409B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a composition having high sensitivity and high resolution and fit for a minute working technique, especially a photoetching technique for manufacturing super LSI by using a copolymer of trichloroethyl methacrylate and alkyl methacrylate.
CONSTITUTION: This composition is a copolymer of trichloroethyl methacrylate and dichloroethyl methacrylate. The copolymn. ratio can arbitrarily be selected in the 99:1W1:99 range, yet it is advantageous to copolymerize the monomers in 99:1W 50:50 in case of use as a positive type resist and in 40:60W1:99 in case of use as a negative type resist. The resulting ionized radiation sensitive resist is dissolved in a suitable solvent, and this resist soln. is applied to a semiconductor substrate or a mask substrate, dried, and prebaked to produce an about 0.1W2μm thick resist film, which is then patterned and developed to form a resist pattern. The exposed part of the substrate is dry or wet etched.
COPYRIGHT: (C)1981,JPO&Japio
JP11494979A 1979-09-07 1979-09-07 Ionized radiation sensitive resist Granted JPS5639537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11494979A JPS5639537A (en) 1979-09-07 1979-09-07 Ionized radiation sensitive resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11494979A JPS5639537A (en) 1979-09-07 1979-09-07 Ionized radiation sensitive resist

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP10100681A Division JPS57108847A (en) 1981-06-29 1981-06-29 Negative type resist sensitive to ionized radiation

Publications (2)

Publication Number Publication Date
JPS5639537A true JPS5639537A (en) 1981-04-15
JPS5719409B2 JPS5719409B2 (en) 1982-04-22

Family

ID=14650638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11494979A Granted JPS5639537A (en) 1979-09-07 1979-09-07 Ionized radiation sensitive resist

Country Status (1)

Country Link
JP (1) JPS5639537A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01253121A (en) * 1988-03-31 1989-10-09 Taiyo Yuden Co Ltd Manufacture of cross conductor

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5344441A (en) * 1976-10-04 1978-04-21 Ibm Material for resist
JPS5376825A (en) * 1976-12-20 1978-07-07 Cho Lsi Gijutsu Kenkyu Kumiai Radiation sensitive positive regist material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5344441A (en) * 1976-10-04 1978-04-21 Ibm Material for resist
JPS5376825A (en) * 1976-12-20 1978-07-07 Cho Lsi Gijutsu Kenkyu Kumiai Radiation sensitive positive regist material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01253121A (en) * 1988-03-31 1989-10-09 Taiyo Yuden Co Ltd Manufacture of cross conductor

Also Published As

Publication number Publication date
JPS5719409B2 (en) 1982-04-22

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