JPS5629232A - Pattern forming material - Google Patents
Pattern forming materialInfo
- Publication number
- JPS5629232A JPS5629232A JP10352179A JP10352179A JPS5629232A JP S5629232 A JPS5629232 A JP S5629232A JP 10352179 A JP10352179 A JP 10352179A JP 10352179 A JP10352179 A JP 10352179A JP S5629232 A JPS5629232 A JP S5629232A
- Authority
- JP
- Japan
- Prior art keywords
- copolymer
- tert
- formula
- ultraviolet rays
- butyl methacrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To obtain a material forming the pattern of a circuit such as an integrated circuit and having high sensitivity and high resolution by using a copolymer contg. a specified percentage of tert-butyl methacrylate units as a resist material against deep ultraviolet rays.
CONSTITUTION: A copolymer contg. 20W95% tert-butyl methacrylate units represented by formula I is used as a resist material. This copolymer is represented by formula II. This resist is fit for lithography with deep ultraviolet rays of 180W 350nm wavelengths and has superior resolution and sensitivity with a small quantity of exposure in the formation of a ≤1μ minute pattern.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10352179A JPS5629232A (en) | 1979-08-16 | 1979-08-16 | Pattern forming material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10352179A JPS5629232A (en) | 1979-08-16 | 1979-08-16 | Pattern forming material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5629232A true JPS5629232A (en) | 1981-03-24 |
Family
ID=14356230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10352179A Pending JPS5629232A (en) | 1979-08-16 | 1979-08-16 | Pattern forming material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5629232A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0102450A2 (en) * | 1982-08-23 | 1984-03-14 | International Business Machines Corporation | Resist compositions |
JPH03113449A (en) * | 1989-09-27 | 1991-05-14 | Agency Of Ind Science & Technol | Resin composition sensitive to visible light |
-
1979
- 1979-08-16 JP JP10352179A patent/JPS5629232A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0102450A2 (en) * | 1982-08-23 | 1984-03-14 | International Business Machines Corporation | Resist compositions |
US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
EP0102450A3 (en) * | 1982-08-23 | 1986-10-15 | International Business Machines Corporation | Resist compositions |
JPH03113449A (en) * | 1989-09-27 | 1991-05-14 | Agency Of Ind Science & Technol | Resin composition sensitive to visible light |
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