JPS57108847A - Negative type resist sensitive to ionized radiation - Google Patents

Negative type resist sensitive to ionized radiation

Info

Publication number
JPS57108847A
JPS57108847A JP10100681A JP10100681A JPS57108847A JP S57108847 A JPS57108847 A JP S57108847A JP 10100681 A JP10100681 A JP 10100681A JP 10100681 A JP10100681 A JP 10100681A JP S57108847 A JPS57108847 A JP S57108847A
Authority
JP
Japan
Prior art keywords
methacrylate
resist
negative type
dichloroethyl
type resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10100681A
Other languages
Japanese (ja)
Other versions
JPH0124290B2 (en
Inventor
Hirohisa Kato
Tsukasa Tada
Takamaro Mizoguchi
Masanobu Koda
Yuzo Shimazaki
Hideo Saeki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP10100681A priority Critical patent/JPS57108847A/en
Publication of JPS57108847A publication Critical patent/JPS57108847A/en
Publication of JPH0124290B2 publication Critical patent/JPH0124290B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Abstract

PURPOSE:To improve sensitivity and resolution, by using a copolymer of trichloroethyl methacrylate and dichloroethyl methacrylate for a negative type resist. CONSTITUTION:A copolymer used for a negative type resist is obtained by copolymerizing trichloroethyl methacrylate and dichloroethyl methacrylate in 40:60-1:99 ratio. Use of <=60% dichloroethyl methacrylate drops sensitivity and resolution, and use of >=99% easily causes cross-linking in treatment of prebaking or the like and drops stability. Intramolecular cross-linking is remarkably accelerated by ionized radiation and further, ion etching resistance of a formed resist pattern is improved because of characteristics of each monomer and chlorine in the resist. A resist film with 0.1-2mum thickness is used. It is prepared by coating a resist solution on a substrate, drying, and prebaking it.
JP10100681A 1981-06-29 1981-06-29 Negative type resist sensitive to ionized radiation Granted JPS57108847A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10100681A JPS57108847A (en) 1981-06-29 1981-06-29 Negative type resist sensitive to ionized radiation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10100681A JPS57108847A (en) 1981-06-29 1981-06-29 Negative type resist sensitive to ionized radiation

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11494979A Division JPS5639537A (en) 1979-09-07 1979-09-07 Ionized radiation sensitive resist

Publications (2)

Publication Number Publication Date
JPS57108847A true JPS57108847A (en) 1982-07-07
JPH0124290B2 JPH0124290B2 (en) 1989-05-11

Family

ID=14289157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10100681A Granted JPS57108847A (en) 1981-06-29 1981-06-29 Negative type resist sensitive to ionized radiation

Country Status (1)

Country Link
JP (1) JPS57108847A (en)

Also Published As

Publication number Publication date
JPH0124290B2 (en) 1989-05-11

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