JPS55151637A - Radiation sensitive material and film forming method - Google Patents

Radiation sensitive material and film forming method

Info

Publication number
JPS55151637A
JPS55151637A JP5984879A JP5984879A JPS55151637A JP S55151637 A JPS55151637 A JP S55151637A JP 5984879 A JP5984879 A JP 5984879A JP 5984879 A JP5984879 A JP 5984879A JP S55151637 A JPS55151637 A JP S55151637A
Authority
JP
Japan
Prior art keywords
butyl methacrylate
film forming
forming method
sensitive material
radiation sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5984879A
Other languages
Japanese (ja)
Other versions
JPS5857734B2 (en
Inventor
Hideo Saeki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP54059848A priority Critical patent/JPS5857734B2/en
Publication of JPS55151637A publication Critical patent/JPS55151637A/en
Publication of JPS5857734B2 publication Critical patent/JPS5857734B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To obtain a positive type resist material having high sensitivity, superior heat resistance and superior etching resistance by copolymerizing methyl methacrylate and t-butyl methacrylate.
CONSTITUTION: Methyl methacrylate and t-butyl methacrylate are copolymerized to form a copolymer contg. about 5W50mol% t-butyl methacrylate units and having a wt. average mol. wt. of 100,000Wseveral millions, a dispersion degree of about 4 or less and a glass transition point of about 100°C or below. When this copolymer is used as a resist material, it is dissolved in a low-viscosity volatile org. solvent such as toluene or trichloroethylene, and the resulting soln. is coated onto a body and heat treated at about 200W270°C to form a film.
COPYRIGHT: (C)1980,JPO&Japio
JP54059848A 1979-05-15 1979-05-15 Film forming method Expired JPS5857734B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54059848A JPS5857734B2 (en) 1979-05-15 1979-05-15 Film forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54059848A JPS5857734B2 (en) 1979-05-15 1979-05-15 Film forming method

Publications (2)

Publication Number Publication Date
JPS55151637A true JPS55151637A (en) 1980-11-26
JPS5857734B2 JPS5857734B2 (en) 1983-12-21

Family

ID=13125022

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54059848A Expired JPS5857734B2 (en) 1979-05-15 1979-05-15 Film forming method

Country Status (1)

Country Link
JP (1) JPS5857734B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887160A (en) * 1981-11-18 1983-05-24 Dainippon Ink & Chem Inc Acrylic lacquer
JPH03113449A (en) * 1989-09-27 1991-05-14 Agency Of Ind Science & Technol Resin composition sensitive to visible light

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915372A (en) * 1972-03-24 1974-02-09

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915372A (en) * 1972-03-24 1974-02-09

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887160A (en) * 1981-11-18 1983-05-24 Dainippon Ink & Chem Inc Acrylic lacquer
JPS627230B2 (en) * 1981-11-18 1987-02-16 Dainippon Ink & Chemicals
JPH03113449A (en) * 1989-09-27 1991-05-14 Agency Of Ind Science & Technol Resin composition sensitive to visible light

Also Published As

Publication number Publication date
JPS5857734B2 (en) 1983-12-21

Similar Documents

Publication Publication Date Title
JPS53125491A (en) Fluorine-containing polymer easily curable and its curable composition
JPS53126093A (en) Preparation of aqueous polymer emulsion having modified stability
JPS51111072A (en) Photo etching method
JPS53138492A (en) Production of emulsion composition for baking coating
JPS53115781A (en) Manufacture of thermoplastic resin film of improved anti-fogging and non- blocking properties
DE2860978D1 (en) Process for the preparation of a low molecular weight acrylate copolymer, and a liquid coating composition having a high solids content based on the acrylate copolymer thus obtained
JPS55151637A (en) Radiation sensitive material and film forming method
JPS51125482A (en) Photo-curable latex composition
JPS5374554A (en) Water-soluble and hydrophilic composition
JPS53149247A (en) Antistatic polyester composition
JPS51131559A (en) Aqueous composition of vinyl copolymer with good stability and process for preparing it
JPS5340028A (en) Adhesive composition
JPS5518473A (en) Ionic radiation sensitive negative type resist
JPS51115543A (en) Pressure-sinsitive adhesive composition
JPS52135385A (en) Improved laminates
JPS5374553A (en) Water-insoluble, hydrophilic composition
JPS52146218A (en) Positive type radiation sensitive material
JPS5643634A (en) Negative type resist material
JPS55149940A (en) Negative type resist material
JPS53114677A (en) Processing method for resist
JPS51142030A (en) Water-soluble acid-curing type paint
JPS5456375A (en) Positive type resist for dry etching
JPS5287449A (en) Methacrylic resin composition
JPS55134845A (en) Electron beam resist
JPS53108178A (en) Coated plastic film