JPS5518473A - Ionic radiation sensitive negative type resist - Google Patents

Ionic radiation sensitive negative type resist

Info

Publication number
JPS5518473A
JPS5518473A JP9237478A JP9237478A JPS5518473A JP S5518473 A JPS5518473 A JP S5518473A JP 9237478 A JP9237478 A JP 9237478A JP 9237478 A JP9237478 A JP 9237478A JP S5518473 A JPS5518473 A JP S5518473A
Authority
JP
Japan
Prior art keywords
radiation sensitive
negative type
type resist
sensitive negative
ionic radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9237478A
Other languages
Japanese (ja)
Inventor
Hirohisa Kato
Hideo Saeki
Tsukasa Tada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP9237478A priority Critical patent/JPS5518473A/en
Publication of JPS5518473A publication Critical patent/JPS5518473A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: An ionic radiation sensitive negative type resist that is composed of a polymer obtained mainly from a specific vinyl ether monomer, thus being good at sensitivity and etching resistance.
CONSTITUTION: A polymer from at least one selected from vinyl ether monomers of the formula or copolymer thereof with other vinyl monomers is dissolved in an adequate solvent.
COPYRIGHT: (C)1980,JPO&Japio
JP9237478A 1978-07-28 1978-07-28 Ionic radiation sensitive negative type resist Pending JPS5518473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9237478A JPS5518473A (en) 1978-07-28 1978-07-28 Ionic radiation sensitive negative type resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9237478A JPS5518473A (en) 1978-07-28 1978-07-28 Ionic radiation sensitive negative type resist

Publications (1)

Publication Number Publication Date
JPS5518473A true JPS5518473A (en) 1980-02-08

Family

ID=14052643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9237478A Pending JPS5518473A (en) 1978-07-28 1978-07-28 Ionic radiation sensitive negative type resist

Country Status (1)

Country Link
JP (1) JPS5518473A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59217775A (en) * 1983-05-24 1984-12-07 Pentel Kk Ink for ball point pen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59217775A (en) * 1983-05-24 1984-12-07 Pentel Kk Ink for ball point pen
JPH0578594B2 (en) * 1983-05-24 1993-10-29 Pentel Kk

Similar Documents

Publication Publication Date Title
JPS53126093A (en) Preparation of aqueous polymer emulsion having modified stability
JPS5466829A (en) Pattern formation materil
JPS5343787A (en) Emulsifier for emulsion polymerization
JPS5518473A (en) Ionic radiation sensitive negative type resist
JPS5653114A (en) Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays
JPS52128132A (en) Positive type electron beam sensitive composition
JPS5466122A (en) Pattern formation material
JPS5317688A (en) Aciddresistant copolymers and photographic element
JPS5518673A (en) Ionized radiation sensitive negative type resist
JPS5359367A (en) Formation of electron beam resist image
JPS5381114A (en) Radiation sensitive material
JPS52146218A (en) Positive type radiation sensitive material
JPS5411988A (en) Preparation of vinyl chloride polymer
JPS5421484A (en) Polymerization of vinyl chloride
JPS536394A (en) Functional high polymers
JPS5430288A (en) New perfluoroalkyl-group-containing copolymer
JPS5343742A (en) Tackifying substance and its preparation
JPS55149940A (en) Negative type resist material
JPS53114677A (en) Processing method for resist
JPS51131559A (en) Aqueous composition of vinyl copolymer with good stability and process for preparing it
JPS55151637A (en) Radiation sensitive material and film forming method
JPS5385883A (en) Fluorine-containing copolymer and its application
JPS5377292A (en) Preparation of novel resin
JPS5382890A (en) Emulsion polymerization process
JPS5327688A (en) Preparation of impact resistant, weather resistant graft copolymer