JPS55149940A - Negative type resist material - Google Patents

Negative type resist material

Info

Publication number
JPS55149940A
JPS55149940A JP5799079A JP5799079A JPS55149940A JP S55149940 A JPS55149940 A JP S55149940A JP 5799079 A JP5799079 A JP 5799079A JP 5799079 A JP5799079 A JP 5799079A JP S55149940 A JPS55149940 A JP S55149940A
Authority
JP
Japan
Prior art keywords
resist material
negative type
type resist
average mol
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5799079A
Other languages
Japanese (ja)
Other versions
JPS616372B2 (en
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5799079A priority Critical patent/JPS55149940A/en
Publication of JPS55149940A publication Critical patent/JPS55149940A/en
Publication of JPS616372B2 publication Critical patent/JPS616372B2/ja
Granted legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE: To obtain a negative type resist material with high sensitivity, superior resolution, superior heat and dry etching resistances, etc. for ionized radiation lithography by using a specified copolymer of isocyanurate and diallyl phthalate.
CONSTITUTION: A copolymer obtd. by copolymerizing triallylisocyanurate and ortho-, iso- or paradiallylphthalate is used as a negative type resist material. The copolymer preferably has a wt. average mol. wt. of about 2,000W250,000 and a dispersion degree (wt. average mol. wt./number average mol. wt.) of about 1W3, and the iodine value of the allyl groups contained is preferably about 30W110. A mixed solvent of monochlorobenzene and isoamyl acetate, methylisobutyl ketone, or the like is suitable for use as a developer for the resist material.
COPYRIGHT: (C)1980,JPO&Japio
JP5799079A 1979-05-14 1979-05-14 Negative type resist material Granted JPS55149940A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5799079A JPS55149940A (en) 1979-05-14 1979-05-14 Negative type resist material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5799079A JPS55149940A (en) 1979-05-14 1979-05-14 Negative type resist material

Publications (2)

Publication Number Publication Date
JPS55149940A true JPS55149940A (en) 1980-11-21
JPS616372B2 JPS616372B2 (en) 1986-02-26

Family

ID=13071437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5799079A Granted JPS55149940A (en) 1979-05-14 1979-05-14 Negative type resist material

Country Status (1)

Country Link
JP (1) JPS55149940A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03281513A (en) * 1990-03-29 1991-12-12 Nippon Kasei Chem Co Ltd Liquid composition
WO2018037912A1 (en) * 2016-08-22 2018-03-01 株式会社大阪ソーダ Photocurable resin composition, ink and coating material

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03281513A (en) * 1990-03-29 1991-12-12 Nippon Kasei Chem Co Ltd Liquid composition
WO2018037912A1 (en) * 2016-08-22 2018-03-01 株式会社大阪ソーダ Photocurable resin composition, ink and coating material
CN109641985A (en) * 2016-08-22 2019-04-16 株式会社大阪曹达 Photocurable resin composition, ink and coating
US11149157B2 (en) 2016-08-22 2021-10-19 Osaka Soda Co., Ltd. Photocurable resin composition, ink and coating material
CN109641985B (en) * 2016-08-22 2022-04-22 株式会社大阪曹达 Photocurable resin composition, ink, and coating material

Also Published As

Publication number Publication date
JPS616372B2 (en) 1986-02-26

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