JPS55149940A - Negative type resist material - Google Patents
Negative type resist materialInfo
- Publication number
- JPS55149940A JPS55149940A JP5799079A JP5799079A JPS55149940A JP S55149940 A JPS55149940 A JP S55149940A JP 5799079 A JP5799079 A JP 5799079A JP 5799079 A JP5799079 A JP 5799079A JP S55149940 A JPS55149940 A JP S55149940A
- Authority
- JP
- Japan
- Prior art keywords
- resist material
- negative type
- type resist
- average mol
- copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE: To obtain a negative type resist material with high sensitivity, superior resolution, superior heat and dry etching resistances, etc. for ionized radiation lithography by using a specified copolymer of isocyanurate and diallyl phthalate.
CONSTITUTION: A copolymer obtd. by copolymerizing triallylisocyanurate and ortho-, iso- or paradiallylphthalate is used as a negative type resist material. The copolymer preferably has a wt. average mol. wt. of about 2,000W250,000 and a dispersion degree (wt. average mol. wt./number average mol. wt.) of about 1W3, and the iodine value of the allyl groups contained is preferably about 30W110. A mixed solvent of monochlorobenzene and isoamyl acetate, methylisobutyl ketone, or the like is suitable for use as a developer for the resist material.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5799079A JPS55149940A (en) | 1979-05-14 | 1979-05-14 | Negative type resist material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5799079A JPS55149940A (en) | 1979-05-14 | 1979-05-14 | Negative type resist material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55149940A true JPS55149940A (en) | 1980-11-21 |
JPS616372B2 JPS616372B2 (en) | 1986-02-26 |
Family
ID=13071437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5799079A Granted JPS55149940A (en) | 1979-05-14 | 1979-05-14 | Negative type resist material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55149940A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03281513A (en) * | 1990-03-29 | 1991-12-12 | Nippon Kasei Chem Co Ltd | Liquid composition |
WO2018037912A1 (en) * | 2016-08-22 | 2018-03-01 | 株式会社大阪ソーダ | Photocurable resin composition, ink and coating material |
-
1979
- 1979-05-14 JP JP5799079A patent/JPS55149940A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03281513A (en) * | 1990-03-29 | 1991-12-12 | Nippon Kasei Chem Co Ltd | Liquid composition |
WO2018037912A1 (en) * | 2016-08-22 | 2018-03-01 | 株式会社大阪ソーダ | Photocurable resin composition, ink and coating material |
CN109641985A (en) * | 2016-08-22 | 2019-04-16 | 株式会社大阪曹达 | Photocurable resin composition, ink and coating |
US11149157B2 (en) | 2016-08-22 | 2021-10-19 | Osaka Soda Co., Ltd. | Photocurable resin composition, ink and coating material |
CN109641985B (en) * | 2016-08-22 | 2022-04-22 | 株式会社大阪曹达 | Photocurable resin composition, ink, and coating material |
Also Published As
Publication number | Publication date |
---|---|
JPS616372B2 (en) | 1986-02-26 |
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