JPS5674245A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS5674245A
JPS5674245A JP15181279A JP15181279A JPS5674245A JP S5674245 A JPS5674245 A JP S5674245A JP 15181279 A JP15181279 A JP 15181279A JP 15181279 A JP15181279 A JP 15181279A JP S5674245 A JPS5674245 A JP S5674245A
Authority
JP
Japan
Prior art keywords
pattern
pattern forming
triallyl isocyanurate
forming method
isocyanurate polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15181279A
Other languages
Japanese (ja)
Other versions
JPS616375B2 (en
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15181279A priority Critical patent/JPS5674245A/en
Publication of JPS5674245A publication Critical patent/JPS5674245A/en
Publication of JPS616375B2 publication Critical patent/JPS616375B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE: To form a pattern superior in resolution and resistance to dry etching, by using a triallyl isocyanurate polymer as a pattern forming material.
CONSTITUTION: A triallyl isocyanurate polymer having 5,000W100,000wt. average mol.wt. and 1W6 dispersion degree is coated on a substrate, and prebaked in a nitrogen atmosphere at about 60W100°C for 15W60min to form a resist film, which is exposed to electron beams, X rays, or ultraviolet rays in accordance with the pattern to be formed on the film, and developed with a developing fluid, such as monochloro-benzene-isoamyl acetate mixture at about 1:2 volume ratio or methyl ethyl ketone-ethanol at about 6:1, thus permitting a pattern of about 1μm to be drawn and transferred.
COPYRIGHT: (C)1981,JPO&Japio
JP15181279A 1979-11-22 1979-11-22 Pattern forming method Granted JPS5674245A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15181279A JPS5674245A (en) 1979-11-22 1979-11-22 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15181279A JPS5674245A (en) 1979-11-22 1979-11-22 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS5674245A true JPS5674245A (en) 1981-06-19
JPS616375B2 JPS616375B2 (en) 1986-02-26

Family

ID=15526839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15181279A Granted JPS5674245A (en) 1979-11-22 1979-11-22 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS5674245A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03281513A (en) * 1990-03-29 1991-12-12 Nippon Kasei Chem Co Ltd Liquid composition
WO2018037912A1 (en) * 2016-08-22 2018-03-01 株式会社大阪ソーダ Photocurable resin composition, ink and coating material
WO2018150764A1 (en) * 2017-02-17 2018-08-23 株式会社大阪ソーダ Thiol-modified polymer, and composition containing said polymer and use thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03281513A (en) * 1990-03-29 1991-12-12 Nippon Kasei Chem Co Ltd Liquid composition
WO2018037912A1 (en) * 2016-08-22 2018-03-01 株式会社大阪ソーダ Photocurable resin composition, ink and coating material
CN109641985A (en) * 2016-08-22 2019-04-16 株式会社大阪曹达 Photocurable resin composition, ink and coating
US11149157B2 (en) 2016-08-22 2021-10-19 Osaka Soda Co., Ltd. Photocurable resin composition, ink and coating material
CN109641985B (en) * 2016-08-22 2022-04-22 株式会社大阪曹达 Photocurable resin composition, ink, and coating material
WO2018150764A1 (en) * 2017-02-17 2018-08-23 株式会社大阪ソーダ Thiol-modified polymer, and composition containing said polymer and use thereof

Also Published As

Publication number Publication date
JPS616375B2 (en) 1986-02-26

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