JPS5674244A - Pattern forming method - Google Patents
Pattern forming methodInfo
- Publication number
- JPS5674244A JPS5674244A JP15181079A JP15181079A JPS5674244A JP S5674244 A JPS5674244 A JP S5674244A JP 15181079 A JP15181079 A JP 15181079A JP 15181079 A JP15181079 A JP 15181079A JP S5674244 A JPS5674244 A JP S5674244A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- average mol
- dicarboxylic acid
- weight average
- pattern forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To form a minute pattern superior in resolution and resistance to dry etching, by using a specified dicarboxylic acid diallyl ester polymer as a pattern forming material.
CONSTITUTION: A dicarboxylic acid diallyl ester polymer having 5,000W50,000 weight average mol.wt. and 1W2.5 dispersion degree, that is, number average mol.wt./weight average mol.wt. ratio is selected by fractional precipitation, and this polymer is dissolved in a solvent such as 2-methoxyethyl acetate to form a resist fluid, which is coated on a substrate and dried to form a resist film. This film is exposed to electron beams or X rays in accordance with the pattern to be formed on the resist film and developed, thus permitting a grating pattern having square faces ≤μm line/1μm space to be resolved.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54151810A JPS6058463B2 (en) | 1979-11-22 | 1979-11-22 | Pattern formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54151810A JPS6058463B2 (en) | 1979-11-22 | 1979-11-22 | Pattern formation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5674244A true JPS5674244A (en) | 1981-06-19 |
JPS6058463B2 JPS6058463B2 (en) | 1985-12-20 |
Family
ID=15526798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54151810A Expired JPS6058463B2 (en) | 1979-11-22 | 1979-11-22 | Pattern formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6058463B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017169661A1 (en) * | 2016-03-31 | 2017-10-05 | 株式会社大阪ソーダ | Photocurable resin composition and cured product of same |
-
1979
- 1979-11-22 JP JP54151810A patent/JPS6058463B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017169661A1 (en) * | 2016-03-31 | 2017-10-05 | 株式会社大阪ソーダ | Photocurable resin composition and cured product of same |
JPWO2017169661A1 (en) * | 2016-03-31 | 2019-02-14 | 株式会社大阪ソーダ | Photocurable resin composition and cured product thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS6058463B2 (en) | 1985-12-20 |
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