JPS5546574A - Contact exposure photomask - Google Patents
Contact exposure photomaskInfo
- Publication number
- JPS5546574A JPS5546574A JP12074378A JP12074378A JPS5546574A JP S5546574 A JPS5546574 A JP S5546574A JP 12074378 A JP12074378 A JP 12074378A JP 12074378 A JP12074378 A JP 12074378A JP S5546574 A JPS5546574 A JP S5546574A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- substrate
- degassing
- grooves
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To improve the contact of exposure photomast with semiconductor wafer by forming a plurality of degassing grooves in a substrate exposed with opaque layers when predetermined pattern of opaque layers are coated on one surface of a light transmissive substrate as a photomask.
CONSTITUTION: Opaque layers 12 are coated in approx. 0.1μm thick according to predetermined pattern using chromium, chromium oxide, iron oxide or the like on a light transmissive substrate 11 such as glass plate. Then, a plurality of degassing grooves 13 are perforated at suitable interval in the substrate 11 exposed at the layers 12 side. The grooves 13 have a width of larger than 5μm or a depth of larger than 3μm and a length from one to the other ends of a semiconductor wafer. Thus, degassing can be rapidly and completely conducted to thereby improve the contact of the semiconductor wafer on the photomask to thus obtain precisely fine pattern.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12074378A JPS5546574A (en) | 1978-09-30 | 1978-09-30 | Contact exposure photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12074378A JPS5546574A (en) | 1978-09-30 | 1978-09-30 | Contact exposure photomask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5546574A true JPS5546574A (en) | 1980-04-01 |
Family
ID=14793878
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12074378A Pending JPS5546574A (en) | 1978-09-30 | 1978-09-30 | Contact exposure photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5546574A (en) |
-
1978
- 1978-09-30 JP JP12074378A patent/JPS5546574A/en active Pending
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