JPS53112673A - Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution - Google Patents

Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution

Info

Publication number
JPS53112673A
JPS53112673A JP2744777A JP2744777A JPS53112673A JP S53112673 A JPS53112673 A JP S53112673A JP 2744777 A JP2744777 A JP 2744777A JP 2744777 A JP2744777 A JP 2744777A JP S53112673 A JPS53112673 A JP S53112673A
Authority
JP
Japan
Prior art keywords
execution
semiconductor device
manufacturing process
device manufacturing
alignment method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2744777A
Other languages
Japanese (ja)
Inventor
Hisashi Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP2744777A priority Critical patent/JPS53112673A/en
Publication of JPS53112673A publication Critical patent/JPS53112673A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To increase the degree of close adhesion, by forming grooves on the pattern surface side and by taking the negative pressure in the space between the substrate and mask formed with the grooves negative.
COPYRIGHT: (C)1978,JPO&Japio
JP2744777A 1977-03-12 1977-03-12 Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution Pending JPS53112673A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2744777A JPS53112673A (en) 1977-03-12 1977-03-12 Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2744777A JPS53112673A (en) 1977-03-12 1977-03-12 Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution

Publications (1)

Publication Number Publication Date
JPS53112673A true JPS53112673A (en) 1978-10-02

Family

ID=12221364

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2744777A Pending JPS53112673A (en) 1977-03-12 1977-03-12 Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution

Country Status (1)

Country Link
JP (1) JPS53112673A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03219084A (en) * 1989-11-15 1991-09-26 Fuji Plant Kogyo Kk Sealing material for partial plating and its production and partial plating method
JPH05142760A (en) * 1991-11-25 1993-06-11 Sharp Corp Photomask

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52153669A (en) * 1976-06-16 1977-12-20 Toshiba Corp Photo mask of semiconductor integrated circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52153669A (en) * 1976-06-16 1977-12-20 Toshiba Corp Photo mask of semiconductor integrated circuit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03219084A (en) * 1989-11-15 1991-09-26 Fuji Plant Kogyo Kk Sealing material for partial plating and its production and partial plating method
JPH05142760A (en) * 1991-11-25 1993-06-11 Sharp Corp Photomask

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