JPS52117555A - Formation of photo mask - Google Patents
Formation of photo maskInfo
- Publication number
- JPS52117555A JPS52117555A JP3482876A JP3482876A JPS52117555A JP S52117555 A JPS52117555 A JP S52117555A JP 3482876 A JP3482876 A JP 3482876A JP 3482876 A JP3482876 A JP 3482876A JP S52117555 A JPS52117555 A JP S52117555A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- formation
- resist
- etching
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To form non-light transmissible layer on light transmissible substrate with impurity added in order to increase the etching rate, and then to form the groove through ion etching or spatter etching using the resist for the mask and then to to remove the resist. Thus, photo mask of good adhesion property can be obtained.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3482876A JPS52117555A (en) | 1976-03-30 | 1976-03-30 | Formation of photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3482876A JPS52117555A (en) | 1976-03-30 | 1976-03-30 | Formation of photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52117555A true JPS52117555A (en) | 1977-10-03 |
Family
ID=12425049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3482876A Pending JPS52117555A (en) | 1976-03-30 | 1976-03-30 | Formation of photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52117555A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016018187A (en) * | 2014-07-11 | 2016-02-01 | 株式会社ディスコ | Method for producing exposure mask |
-
1976
- 1976-03-30 JP JP3482876A patent/JPS52117555A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016018187A (en) * | 2014-07-11 | 2016-02-01 | 株式会社ディスコ | Method for producing exposure mask |
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