JPS52144972A - Formation method of photo resist film - Google Patents

Formation method of photo resist film

Info

Publication number
JPS52144972A
JPS52144972A JP6114776A JP6114776A JPS52144972A JP S52144972 A JPS52144972 A JP S52144972A JP 6114776 A JP6114776 A JP 6114776A JP 6114776 A JP6114776 A JP 6114776A JP S52144972 A JPS52144972 A JP S52144972A
Authority
JP
Japan
Prior art keywords
resist film
formation method
photo resist
wafers
working
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6114776A
Other languages
Japanese (ja)
Inventor
Hiroshi Yanagisawa
Toshiharu Matsuzawa
Yoshifumi Kawamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6114776A priority Critical patent/JPS52144972A/en
Publication of JPS52144972A publication Critical patent/JPS52144972A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To modify the properties of the surfaces of working wafers to the condition wherein moisture is hard to be adsorbed and improve adhesion by using 2.2.2-ethanol trifluoride as working wafers.
COPYRIGHT: (C)1977,JPO&Japio
JP6114776A 1976-05-28 1976-05-28 Formation method of photo resist film Pending JPS52144972A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6114776A JPS52144972A (en) 1976-05-28 1976-05-28 Formation method of photo resist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6114776A JPS52144972A (en) 1976-05-28 1976-05-28 Formation method of photo resist film

Publications (1)

Publication Number Publication Date
JPS52144972A true JPS52144972A (en) 1977-12-02

Family

ID=13162694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6114776A Pending JPS52144972A (en) 1976-05-28 1976-05-28 Formation method of photo resist film

Country Status (1)

Country Link
JP (1) JPS52144972A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6425535A (en) * 1987-07-22 1989-01-27 Matsushita Electronics Corp Treatment of substrate for forming resist film
JPH01155625A (en) * 1987-12-14 1989-06-19 Koujiyundo Kagaku Kenkyusho:Kk Bonding process of multilayer resist film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6425535A (en) * 1987-07-22 1989-01-27 Matsushita Electronics Corp Treatment of substrate for forming resist film
JPH01155625A (en) * 1987-12-14 1989-06-19 Koujiyundo Kagaku Kenkyusho:Kk Bonding process of multilayer resist film

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