JPS52156583A - Electrode formation method in semiconductor device - Google Patents
Electrode formation method in semiconductor deviceInfo
- Publication number
- JPS52156583A JPS52156583A JP7318676A JP7318676A JPS52156583A JP S52156583 A JPS52156583 A JP S52156583A JP 7318676 A JP7318676 A JP 7318676A JP 7318676 A JP7318676 A JP 7318676A JP S52156583 A JPS52156583 A JP S52156583A
- Authority
- JP
- Japan
- Prior art keywords
- electrode formation
- semiconductor device
- formation method
- allowance
- integration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
Abstract
PURPOSE: To reduce the degree of allowance of wiring at the time of electrode formation and increase the scale of integration by combining a double coating method with lift-off techniques.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7318676A JPS52156583A (en) | 1976-06-23 | 1976-06-23 | Electrode formation method in semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7318676A JPS52156583A (en) | 1976-06-23 | 1976-06-23 | Electrode formation method in semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52156583A true JPS52156583A (en) | 1977-12-27 |
Family
ID=13510847
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7318676A Pending JPS52156583A (en) | 1976-06-23 | 1976-06-23 | Electrode formation method in semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52156583A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5944824A (en) * | 1982-08-02 | 1984-03-13 | フエアチアイルド・カメラ・アンド・インストルメント・コ−ポレ−シヨン | Lift off method of foring self-aligning contact |
JPS63170925A (en) * | 1986-08-27 | 1988-07-14 | Hitachi Ltd | Formation of wiring on substrate and lift-off film |
-
1976
- 1976-06-23 JP JP7318676A patent/JPS52156583A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5944824A (en) * | 1982-08-02 | 1984-03-13 | フエアチアイルド・カメラ・アンド・インストルメント・コ−ポレ−シヨン | Lift off method of foring self-aligning contact |
JPS63170925A (en) * | 1986-08-27 | 1988-07-14 | Hitachi Ltd | Formation of wiring on substrate and lift-off film |
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