JPS52156583A - Electrode formation method in semiconductor device - Google Patents

Electrode formation method in semiconductor device

Info

Publication number
JPS52156583A
JPS52156583A JP7318676A JP7318676A JPS52156583A JP S52156583 A JPS52156583 A JP S52156583A JP 7318676 A JP7318676 A JP 7318676A JP 7318676 A JP7318676 A JP 7318676A JP S52156583 A JPS52156583 A JP S52156583A
Authority
JP
Japan
Prior art keywords
electrode formation
semiconductor device
formation method
allowance
integration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7318676A
Other languages
Japanese (ja)
Inventor
Tadao Kachi
Akio Hayasaka
Yoshio Honma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7318676A priority Critical patent/JPS52156583A/en
Publication of JPS52156583A publication Critical patent/JPS52156583A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To reduce the degree of allowance of wiring at the time of electrode formation and increase the scale of integration by combining a double coating method with lift-off techniques.
COPYRIGHT: (C)1977,JPO&Japio
JP7318676A 1976-06-23 1976-06-23 Electrode formation method in semiconductor device Pending JPS52156583A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7318676A JPS52156583A (en) 1976-06-23 1976-06-23 Electrode formation method in semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7318676A JPS52156583A (en) 1976-06-23 1976-06-23 Electrode formation method in semiconductor device

Publications (1)

Publication Number Publication Date
JPS52156583A true JPS52156583A (en) 1977-12-27

Family

ID=13510847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7318676A Pending JPS52156583A (en) 1976-06-23 1976-06-23 Electrode formation method in semiconductor device

Country Status (1)

Country Link
JP (1) JPS52156583A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5944824A (en) * 1982-08-02 1984-03-13 フエアチアイルド・カメラ・アンド・インストルメント・コ−ポレ−シヨン Lift off method of foring self-aligning contact
JPS63170925A (en) * 1986-08-27 1988-07-14 Hitachi Ltd Formation of wiring on substrate and lift-off film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5944824A (en) * 1982-08-02 1984-03-13 フエアチアイルド・カメラ・アンド・インストルメント・コ−ポレ−シヨン Lift off method of foring self-aligning contact
JPS63170925A (en) * 1986-08-27 1988-07-14 Hitachi Ltd Formation of wiring on substrate and lift-off film

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