JPS5286076A - Pattern formation of semiconductor element on diazo plate - Google Patents

Pattern formation of semiconductor element on diazo plate

Info

Publication number
JPS5286076A
JPS5286076A JP257676A JP257676A JPS5286076A JP S5286076 A JPS5286076 A JP S5286076A JP 257676 A JP257676 A JP 257676A JP 257676 A JP257676 A JP 257676A JP S5286076 A JPS5286076 A JP S5286076A
Authority
JP
Japan
Prior art keywords
semiconductor element
diazo
plate
pattern formation
diazo compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP257676A
Other languages
Japanese (ja)
Inventor
Ikuo Iwama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP257676A priority Critical patent/JPS5286076A/en
Publication of JPS5286076A publication Critical patent/JPS5286076A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain colored pattern of sharp and high contrast for the edge part with reduced light intensity by forming selectively mask layer on diazo compound layer on the palte for the formation of semiconductor element pattern and by developing the diazo compound in order to form pattern of semiconductore element on the diazo compound layer.
COPYRIGHT: (C)1977,JPO&Japio
JP257676A 1976-01-12 1976-01-12 Pattern formation of semiconductor element on diazo plate Pending JPS5286076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP257676A JPS5286076A (en) 1976-01-12 1976-01-12 Pattern formation of semiconductor element on diazo plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP257676A JPS5286076A (en) 1976-01-12 1976-01-12 Pattern formation of semiconductor element on diazo plate

Publications (1)

Publication Number Publication Date
JPS5286076A true JPS5286076A (en) 1977-07-16

Family

ID=11533188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP257676A Pending JPS5286076A (en) 1976-01-12 1976-01-12 Pattern formation of semiconductor element on diazo plate

Country Status (1)

Country Link
JP (1) JPS5286076A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0334423A (en) * 1989-06-30 1991-02-14 Toshiba Corp Forming method of aperture part for semiconductor element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0334423A (en) * 1989-06-30 1991-02-14 Toshiba Corp Forming method of aperture part for semiconductor element

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