JPS5254379A - Method of registering front and rear patterns - Google Patents

Method of registering front and rear patterns

Info

Publication number
JPS5254379A
JPS5254379A JP50130854A JP13085475A JPS5254379A JP S5254379 A JPS5254379 A JP S5254379A JP 50130854 A JP50130854 A JP 50130854A JP 13085475 A JP13085475 A JP 13085475A JP S5254379 A JPS5254379 A JP S5254379A
Authority
JP
Japan
Prior art keywords
pattern
rear patterns
patterns
position relation
registering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50130854A
Other languages
Japanese (ja)
Inventor
Tatsuyuki Sanada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50130854A priority Critical patent/JPS5254379A/en
Publication of JPS5254379A publication Critical patent/JPS5254379A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To facilitate registering of front and rear patterns by providing a register pattern in the given position relation with a pattern on the front surface of a semiconductor wafer in the state where the semiconductor wafer having a pattern on the front surface is secured to a transparent plate and forming a photoresist pattern in the given position relation with the front pattern on the rear of the wafer.
COPYRIGHT: (C)1977,JPO&Japio
JP50130854A 1975-10-29 1975-10-29 Method of registering front and rear patterns Pending JPS5254379A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50130854A JPS5254379A (en) 1975-10-29 1975-10-29 Method of registering front and rear patterns

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50130854A JPS5254379A (en) 1975-10-29 1975-10-29 Method of registering front and rear patterns

Publications (1)

Publication Number Publication Date
JPS5254379A true JPS5254379A (en) 1977-05-02

Family

ID=15044235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50130854A Pending JPS5254379A (en) 1975-10-29 1975-10-29 Method of registering front and rear patterns

Country Status (1)

Country Link
JP (1) JPS5254379A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04230050A (en) * 1990-06-22 1992-08-19 Internatl Business Mach Corp <Ibm> Apparatus and method for passive alignment, fixing method of object, method and apparatus for alignment of object, and batch manufacturing method
US6936385B2 (en) 2002-03-01 2005-08-30 Asml Netherlands B.V. Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04230050A (en) * 1990-06-22 1992-08-19 Internatl Business Mach Corp <Ibm> Apparatus and method for passive alignment, fixing method of object, method and apparatus for alignment of object, and batch manufacturing method
US6936385B2 (en) 2002-03-01 2005-08-30 Asml Netherlands B.V. Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods

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