JPS5346700A - Exposuring method for resist - Google Patents

Exposuring method for resist

Info

Publication number
JPS5346700A
JPS5346700A JP12131376A JP12131376A JPS5346700A JP S5346700 A JPS5346700 A JP S5346700A JP 12131376 A JP12131376 A JP 12131376A JP 12131376 A JP12131376 A JP 12131376A JP S5346700 A JPS5346700 A JP S5346700A
Authority
JP
Japan
Prior art keywords
resist
exposuring
exposuring method
sharpen
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12131376A
Other languages
Japanese (ja)
Inventor
Koji Igarashi
Niwaji Majima
Shunsuke Matsuyama
Naotake Orihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12131376A priority Critical patent/JPS5346700A/en
Publication of JPS5346700A publication Critical patent/JPS5346700A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To eliminate stripe of monochrome light energy due to steady wave from resist by forming reflection factor reducing layer on the surface of substrate thus to sharpen pattern edge.
COPYRIGHT: (C)1978,JPO&Japio
JP12131376A 1976-10-12 1976-10-12 Exposuring method for resist Pending JPS5346700A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12131376A JPS5346700A (en) 1976-10-12 1976-10-12 Exposuring method for resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12131376A JPS5346700A (en) 1976-10-12 1976-10-12 Exposuring method for resist

Publications (1)

Publication Number Publication Date
JPS5346700A true JPS5346700A (en) 1978-04-26

Family

ID=14808140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12131376A Pending JPS5346700A (en) 1976-10-12 1976-10-12 Exposuring method for resist

Country Status (1)

Country Link
JP (1) JPS5346700A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694738A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Manufacturing method of semiconductor device
JPS58149045A (en) * 1982-02-26 1983-09-05 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Optical lithography
JPS5993448A (en) * 1982-09-30 1984-05-29 ブリューワー・サイエンス・インコーポレイテッド Anti-reflection coating

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498182A (en) * 1972-05-10 1974-01-24
JPS4931282A (en) * 1972-07-21 1974-03-20

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498182A (en) * 1972-05-10 1974-01-24
JPS4931282A (en) * 1972-07-21 1974-03-20

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694738A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Manufacturing method of semiconductor device
JPS58149045A (en) * 1982-02-26 1983-09-05 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Optical lithography
JPH0160813B2 (en) * 1982-02-26 1989-12-26 Intaanashonaru Bijinesu Mashiinzu Corp
JPS5993448A (en) * 1982-09-30 1984-05-29 ブリューワー・サイエンス・インコーポレイテッド Anti-reflection coating
JPH0612452B2 (en) * 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド Method of manufacturing integrated circuit device

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