JPS5223282A - Method of manufacturing semiconductor device - Google Patents
Method of manufacturing semiconductor deviceInfo
- Publication number
- JPS5223282A JPS5223282A JP9998275A JP9998275A JPS5223282A JP S5223282 A JPS5223282 A JP S5223282A JP 9998275 A JP9998275 A JP 9998275A JP 9998275 A JP9998275 A JP 9998275A JP S5223282 A JPS5223282 A JP S5223282A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- manufacturing semiconductor
- eliminating
- reflection
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To make the luminous pattern clear by eliminating the reflection of light by baking photoresist on the surface electrode.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9998275A JPS5223282A (en) | 1975-08-18 | 1975-08-18 | Method of manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9998275A JPS5223282A (en) | 1975-08-18 | 1975-08-18 | Method of manufacturing semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5223282A true JPS5223282A (en) | 1977-02-22 |
JPS544835B2 JPS544835B2 (en) | 1979-03-10 |
Family
ID=14261859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9998275A Granted JPS5223282A (en) | 1975-08-18 | 1975-08-18 | Method of manufacturing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5223282A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62132649A (en) * | 1985-12-05 | 1987-06-15 | ゼロツクス コ−ポレ−シヨン | Impact printer |
-
1975
- 1975-08-18 JP JP9998275A patent/JPS5223282A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62132649A (en) * | 1985-12-05 | 1987-06-15 | ゼロツクス コ−ポレ−シヨン | Impact printer |
JPH0673975B2 (en) * | 1985-12-05 | 1994-09-21 | ゼロツクス コ−ポレ−シヨン | Impact printer |
Also Published As
Publication number | Publication date |
---|---|
JPS544835B2 (en) | 1979-03-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51137393A (en) | Manufacturing method for semiconductor light emitting device | |
JPS5228281A (en) | Light emitting semiconductor device | |
JPS51118395A (en) | Semiconductor emitting unit and manufacturing process | |
JPS5225576A (en) | Exposure method of photo-resist | |
JPS5223282A (en) | Method of manufacturing semiconductor device | |
JPS51111073A (en) | Fine pattern forming | |
JPS51134566A (en) | Semiconductor unit manufacturing process | |
JPS51144253A (en) | Photo-fiber check method | |
JPS51134573A (en) | Semiconductor unit | |
JPS5267271A (en) | Formation of through-hole onto semiconductor substrate | |
JPS5419367A (en) | Production of semiconductor device | |
JPS51140746A (en) | Optical element for surface destruction-proof | |
JPS53142168A (en) | Reproductive use of semiconductor substrate | |
JPS5273673A (en) | Production of semiconductor device | |
JPS51139775A (en) | Method of forming projection electrode | |
JPS5251872A (en) | Production of semiconductor device | |
JPS545659A (en) | Manufacture of semiconductor device | |
JPS51112292A (en) | Semiconductor device | |
JPS5294070A (en) | Process for preparing semi-conductor | |
JPS51151071A (en) | Manufacturing method of a semiconductor apparatus | |
JPS5211790A (en) | Light sensitive semiconductor target | |
JPS5231668A (en) | Production method of semiconductor device which possesses bamp electro de on upper surface of all distribution | |
JPS5421184A (en) | Manufacture for light emitting element | |
JPS5244563A (en) | Method of treating sapphire substrate | |
JPS5427373A (en) | Manufacture of emulsion photo mask |