JPS5294070A - Process for preparing semi-conductor - Google Patents
Process for preparing semi-conductorInfo
- Publication number
- JPS5294070A JPS5294070A JP1098976A JP1098976A JPS5294070A JP S5294070 A JPS5294070 A JP S5294070A JP 1098976 A JP1098976 A JP 1098976A JP 1098976 A JP1098976 A JP 1098976A JP S5294070 A JPS5294070 A JP S5294070A
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- preparing semi
- semi
- preparing
- ohmic contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE: To effect high ohmic contact by roughening base surface.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1098976A JPS5294070A (en) | 1976-02-03 | 1976-02-03 | Process for preparing semi-conductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1098976A JPS5294070A (en) | 1976-02-03 | 1976-02-03 | Process for preparing semi-conductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5294070A true JPS5294070A (en) | 1977-08-08 |
Family
ID=11765549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1098976A Pending JPS5294070A (en) | 1976-02-03 | 1976-02-03 | Process for preparing semi-conductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5294070A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003168653A (en) * | 2001-12-03 | 2003-06-13 | Matsushita Electric Ind Co Ltd | Semiconductor device and method of manufacturing the same |
US7108746B2 (en) * | 2001-05-18 | 2006-09-19 | Integrated Materials, Inc. | Silicon fixture with roughened surface supporting wafers in chemical vapor deposition |
-
1976
- 1976-02-03 JP JP1098976A patent/JPS5294070A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7108746B2 (en) * | 2001-05-18 | 2006-09-19 | Integrated Materials, Inc. | Silicon fixture with roughened surface supporting wafers in chemical vapor deposition |
JP2003168653A (en) * | 2001-12-03 | 2003-06-13 | Matsushita Electric Ind Co Ltd | Semiconductor device and method of manufacturing the same |
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