JPS5384563A - Thin film pattern forming method - Google Patents

Thin film pattern forming method

Info

Publication number
JPS5384563A
JPS5384563A JP16031676A JP16031676A JPS5384563A JP S5384563 A JPS5384563 A JP S5384563A JP 16031676 A JP16031676 A JP 16031676A JP 16031676 A JP16031676 A JP 16031676A JP S5384563 A JPS5384563 A JP S5384563A
Authority
JP
Japan
Prior art keywords
thin film
forming method
pattern forming
film pattern
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16031676A
Other languages
Japanese (ja)
Inventor
Niwaji Majima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16031676A priority Critical patent/JPS5384563A/en
Publication of JPS5384563A publication Critical patent/JPS5384563A/en
Pending legal-status Critical Current

Links

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  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To form uniform thin film, by moving the dust attached to the surface of the substrate through supplying electric charges on the substrate, in forming thin film to the substrate of the vaccum unit.
COPYRIGHT: (C)1978,JPO&Japio
JP16031676A 1976-12-29 1976-12-29 Thin film pattern forming method Pending JPS5384563A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16031676A JPS5384563A (en) 1976-12-29 1976-12-29 Thin film pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16031676A JPS5384563A (en) 1976-12-29 1976-12-29 Thin film pattern forming method

Publications (1)

Publication Number Publication Date
JPS5384563A true JPS5384563A (en) 1978-07-26

Family

ID=15712308

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16031676A Pending JPS5384563A (en) 1976-12-29 1976-12-29 Thin film pattern forming method

Country Status (1)

Country Link
JP (1) JPS5384563A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138233A (en) * 1979-04-12 1980-10-28 Fujitsu Ltd Plasma treatment
JPS5814535A (en) * 1981-07-17 1983-01-27 Fujitsu Ltd Purifying method for wafer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138233A (en) * 1979-04-12 1980-10-28 Fujitsu Ltd Plasma treatment
JPS5833698B2 (en) * 1979-04-12 1983-07-21 富士通株式会社 Plasma treatment method
JPS5814535A (en) * 1981-07-17 1983-01-27 Fujitsu Ltd Purifying method for wafer

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