JPS53147531A - Forming method for thin film pattern - Google Patents

Forming method for thin film pattern

Info

Publication number
JPS53147531A
JPS53147531A JP6233477A JP6233477A JPS53147531A JP S53147531 A JPS53147531 A JP S53147531A JP 6233477 A JP6233477 A JP 6233477A JP 6233477 A JP6233477 A JP 6233477A JP S53147531 A JPS53147531 A JP S53147531A
Authority
JP
Japan
Prior art keywords
thin film
film pattern
forming method
pattern
photoresist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6233477A
Other languages
Japanese (ja)
Other versions
JPS5937494B2 (en
Inventor
Katsuhiro Tsukamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6233477A priority Critical patent/JPS5937494B2/en
Publication of JPS53147531A publication Critical patent/JPS53147531A/en
Publication of JPS5937494B2 publication Critical patent/JPS5937494B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Abstract

PURPOSE:To prevent the occurrence of a defect on the thin film pattern having a revesible pattern of the photoresist film in the lift-off process by previously haardening the surface of the photoresist film formed on the substrate.
JP6233477A 1977-05-27 1977-05-27 Thin film pattern formation method Expired JPS5937494B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6233477A JPS5937494B2 (en) 1977-05-27 1977-05-27 Thin film pattern formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6233477A JPS5937494B2 (en) 1977-05-27 1977-05-27 Thin film pattern formation method

Publications (2)

Publication Number Publication Date
JPS53147531A true JPS53147531A (en) 1978-12-22
JPS5937494B2 JPS5937494B2 (en) 1984-09-10

Family

ID=13197120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6233477A Expired JPS5937494B2 (en) 1977-05-27 1977-05-27 Thin film pattern formation method

Country Status (1)

Country Link
JP (1) JPS5937494B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5637630A (en) * 1979-09-05 1981-04-11 Fujitsu Ltd Formation of thin film
JPS59228648A (en) * 1983-06-10 1984-12-22 Sumitomo Electric Ind Ltd Method for developing photoresist
JPH0886850A (en) * 1994-08-30 1996-04-02 Lg Semicon Co Ltd Manufacture of conductive microbridge
JP2012028818A (en) * 1999-08-31 2012-02-09 E Ink Corp Method of forming patterned semiconductor film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5637630A (en) * 1979-09-05 1981-04-11 Fujitsu Ltd Formation of thin film
JPS59228648A (en) * 1983-06-10 1984-12-22 Sumitomo Electric Ind Ltd Method for developing photoresist
JPH0886850A (en) * 1994-08-30 1996-04-02 Lg Semicon Co Ltd Manufacture of conductive microbridge
JP2012028818A (en) * 1999-08-31 2012-02-09 E Ink Corp Method of forming patterned semiconductor film

Also Published As

Publication number Publication date
JPS5937494B2 (en) 1984-09-10

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