JPS5396678A - Method and apparatus for mask pattern exposure - Google Patents

Method and apparatus for mask pattern exposure

Info

Publication number
JPS5396678A
JPS5396678A JP1069577A JP1069577A JPS5396678A JP S5396678 A JPS5396678 A JP S5396678A JP 1069577 A JP1069577 A JP 1069577A JP 1069577 A JP1069577 A JP 1069577A JP S5396678 A JPS5396678 A JP S5396678A
Authority
JP
Japan
Prior art keywords
mask pattern
pattern exposure
ealize
simplify
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1069577A
Other languages
Japanese (ja)
Inventor
Hideji Shioi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1069577A priority Critical patent/JPS5396678A/en
Publication of JPS5396678A publication Critical patent/JPS5396678A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Abstract

PURPOSE:To simplify the estimate positioning operation and to ealize the method and apparatus for mask pattern exposure of high accuracy even in case of using a film.
JP1069577A 1977-02-04 1977-02-04 Method and apparatus for mask pattern exposure Pending JPS5396678A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1069577A JPS5396678A (en) 1977-02-04 1977-02-04 Method and apparatus for mask pattern exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1069577A JPS5396678A (en) 1977-02-04 1977-02-04 Method and apparatus for mask pattern exposure

Publications (1)

Publication Number Publication Date
JPS5396678A true JPS5396678A (en) 1978-08-24

Family

ID=11757409

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1069577A Pending JPS5396678A (en) 1977-02-04 1977-02-04 Method and apparatus for mask pattern exposure

Country Status (1)

Country Link
JP (1) JPS5396678A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251136A (en) * 1985-04-30 1986-11-08 Toshiba Mach Co Ltd Laser beam lithography and its equipment
JPS61251137A (en) * 1985-04-30 1986-11-08 Toshiba Mach Co Ltd Laser beam lithography and its equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251136A (en) * 1985-04-30 1986-11-08 Toshiba Mach Co Ltd Laser beam lithography and its equipment
JPS61251137A (en) * 1985-04-30 1986-11-08 Toshiba Mach Co Ltd Laser beam lithography and its equipment

Similar Documents

Publication Publication Date Title
JPS51111076A (en) Exposure device
JPS52154369A (en) Method of positioning mask pattern and apparatus therefor
GB1537634A (en) Method of making a negative mask on a substrate
GB2013909B (en) Mask apparatus for fine-line lithography
JPS51120180A (en) Pattern printing device
JPS5339075A (en) Step and repeat exposure method of masks
JPS5386169A (en) Exposure apparatus
JPS5226171A (en) Mask creation method
JPS5341984A (en) Method of positioning exposure mask
JPS5396678A (en) Method and apparatus for mask pattern exposure
JPS52149978A (en) Developing treatment method of photoresist film
IT1099906B (en) APPARATUS FOR POSITIONING A PHOTOGRAPHIC SHEET ON A COMPLEX FOR A PHOTOGRAPHIC PROCESS
JPS54141573A (en) Mask for exposure
JPS5431282A (en) Pattern formation method
JPS5388728A (en) Method of forming pattern
JPS51114934A (en) Exposure equipment for electronic copying machine
JPS53147531A (en) Forming method for thin film pattern
JPS51114931A (en) Photoresist pattern formation method
JPS52143772A (en) Alignment method of masks using special reference marks
JPS52143775A (en) Reduction projecting and printing method and reduction projecting and printing apparatus used in this method
JPS5432978A (en) Correcting method for pattern
JPS53135578A (en) Mark protection method
JPS53133375A (en) Photo ecthing method
JPS5381083A (en) Focusing method of projection exposure apparatus
JPS524830A (en) Developing method

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Effective date: 20041116

Free format text: JAPANESE INTERMEDIATE CODE: A131

A601 Written request for extension of time

Effective date: 20050209

Free format text: JAPANESE INTERMEDIATE CODE: A601

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20050328

A313 Final decision of rejection without a dissenting response from the applicant

Free format text: JAPANESE INTERMEDIATE CODE: A313

Effective date: 20050627

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20050809