JPS5388728A - Method of forming pattern - Google Patents

Method of forming pattern

Info

Publication number
JPS5388728A
JPS5388728A JP247677A JP247677A JPS5388728A JP S5388728 A JPS5388728 A JP S5388728A JP 247677 A JP247677 A JP 247677A JP 247677 A JP247677 A JP 247677A JP S5388728 A JPS5388728 A JP S5388728A
Authority
JP
Japan
Prior art keywords
forming pattern
pattern
exposing
mask
base plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP247677A
Other languages
Japanese (ja)
Inventor
Nobuki Ibaraki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP247677A priority Critical patent/JPS5388728A/en
Publication of JPS5388728A publication Critical patent/JPS5388728A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Abstract

PURPOSE:To easily form a pattern in high accuracy by exposing the photoresist coated on a base plate through a mask of pattern by obliquely radiating incident parallel rays thereto.
JP247677A 1977-01-14 1977-01-14 Method of forming pattern Pending JPS5388728A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP247677A JPS5388728A (en) 1977-01-14 1977-01-14 Method of forming pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP247677A JPS5388728A (en) 1977-01-14 1977-01-14 Method of forming pattern

Publications (1)

Publication Number Publication Date
JPS5388728A true JPS5388728A (en) 1978-08-04

Family

ID=11530377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP247677A Pending JPS5388728A (en) 1977-01-14 1977-01-14 Method of forming pattern

Country Status (1)

Country Link
JP (1) JPS5388728A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56153738A (en) * 1980-04-30 1981-11-27 Fujitsu Ltd Method for contact exposure
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
JPS57204124A (en) * 1981-06-10 1982-12-14 Hitachi Ltd Forming method for minute pattern
JPS63296040A (en) * 1987-05-28 1988-12-02 Toshiba Corp Minute pattern forming method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56153738A (en) * 1980-04-30 1981-11-27 Fujitsu Ltd Method for contact exposure
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
JPS57204124A (en) * 1981-06-10 1982-12-14 Hitachi Ltd Forming method for minute pattern
JPS63296040A (en) * 1987-05-28 1988-12-02 Toshiba Corp Minute pattern forming method

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