JPS53143175A - Electron beam drawing apparatus - Google Patents

Electron beam drawing apparatus

Info

Publication number
JPS53143175A
JPS53143175A JP5771977A JP5771977A JPS53143175A JP S53143175 A JPS53143175 A JP S53143175A JP 5771977 A JP5771977 A JP 5771977A JP 5771977 A JP5771977 A JP 5771977A JP S53143175 A JPS53143175 A JP S53143175A
Authority
JP
Japan
Prior art keywords
electron beam
drawing apparatus
beam drawing
changing
disposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5771977A
Other languages
Japanese (ja)
Inventor
Susumu Ozasa
Katsuhiro Kuroda
Tadasuke Munakata
Shojiro Asai
Akira Yanagisawa
Ichiro Miwa
Genya Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5771977A priority Critical patent/JPS53143175A/en
Publication of JPS53143175A publication Critical patent/JPS53143175A/en
Pending legal-status Critical Current

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Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To draw patterns of intricate shapes efficiently by disposing an aperture plate opened with different pattern-form openings below a condensing electron lens and changing the shape of electron beam flux to a number of kinds by changing over said plate.
COPYRIGHT: (C)1978,JPO&Japio
JP5771977A 1977-05-20 1977-05-20 Electron beam drawing apparatus Pending JPS53143175A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5771977A JPS53143175A (en) 1977-05-20 1977-05-20 Electron beam drawing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5771977A JPS53143175A (en) 1977-05-20 1977-05-20 Electron beam drawing apparatus

Publications (1)

Publication Number Publication Date
JPS53143175A true JPS53143175A (en) 1978-12-13

Family

ID=13063744

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5771977A Pending JPS53143175A (en) 1977-05-20 1977-05-20 Electron beam drawing apparatus

Country Status (1)

Country Link
JP (1) JPS53143175A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183926A (en) * 1985-02-08 1986-08-16 Toshiba Corp Charged beam irradiation unit
JPS6398628U (en) * 1986-12-18 1988-06-25
JPS63175423A (en) * 1987-01-16 1988-07-19 Toshiba Corp Electron beam exposure equipment
JPH02125608A (en) * 1988-11-04 1990-05-14 Fujitsu Ltd Semiconductor manufacturing equipment and manufacture of semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183926A (en) * 1985-02-08 1986-08-16 Toshiba Corp Charged beam irradiation unit
JPS6398628U (en) * 1986-12-18 1988-06-25
JPS63175423A (en) * 1987-01-16 1988-07-19 Toshiba Corp Electron beam exposure equipment
JPH02125608A (en) * 1988-11-04 1990-05-14 Fujitsu Ltd Semiconductor manufacturing equipment and manufacture of semiconductor device

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