JPS53143175A - Electron beam drawing apparatus - Google Patents
Electron beam drawing apparatusInfo
- Publication number
- JPS53143175A JPS53143175A JP5771977A JP5771977A JPS53143175A JP S53143175 A JPS53143175 A JP S53143175A JP 5771977 A JP5771977 A JP 5771977A JP 5771977 A JP5771977 A JP 5771977A JP S53143175 A JPS53143175 A JP S53143175A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- drawing apparatus
- beam drawing
- changing
- disposing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To draw patterns of intricate shapes efficiently by disposing an aperture plate opened with different pattern-form openings below a condensing electron lens and changing the shape of electron beam flux to a number of kinds by changing over said plate.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5771977A JPS53143175A (en) | 1977-05-20 | 1977-05-20 | Electron beam drawing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5771977A JPS53143175A (en) | 1977-05-20 | 1977-05-20 | Electron beam drawing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53143175A true JPS53143175A (en) | 1978-12-13 |
Family
ID=13063744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5771977A Pending JPS53143175A (en) | 1977-05-20 | 1977-05-20 | Electron beam drawing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53143175A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61183926A (en) * | 1985-02-08 | 1986-08-16 | Toshiba Corp | Charged beam irradiation unit |
JPS6398628U (en) * | 1986-12-18 | 1988-06-25 | ||
JPS63175423A (en) * | 1987-01-16 | 1988-07-19 | Toshiba Corp | Electron beam exposure equipment |
JPH02125608A (en) * | 1988-11-04 | 1990-05-14 | Fujitsu Ltd | Semiconductor manufacturing equipment and manufacture of semiconductor device |
-
1977
- 1977-05-20 JP JP5771977A patent/JPS53143175A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61183926A (en) * | 1985-02-08 | 1986-08-16 | Toshiba Corp | Charged beam irradiation unit |
JPS6398628U (en) * | 1986-12-18 | 1988-06-25 | ||
JPS63175423A (en) * | 1987-01-16 | 1988-07-19 | Toshiba Corp | Electron beam exposure equipment |
JPH02125608A (en) * | 1988-11-04 | 1990-05-14 | Fujitsu Ltd | Semiconductor manufacturing equipment and manufacture of semiconductor device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52119178A (en) | Electron beam exposure device | |
JPS5412675A (en) | Electon beam exposure method | |
JPS53143175A (en) | Electron beam drawing apparatus | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
JPS5389673A (en) | Fine pattern forming method of semiconductor device | |
JPS5440572A (en) | Electron-beam pattern projector | |
JPS5442979A (en) | Electron beam exposure device | |
JPS5437685A (en) | Electron beam exposure unit | |
JPS51126072A (en) | Pattern formation equipment | |
JPS5234758A (en) | Process for the fabrication of a character plate | |
JPS52115161A (en) | Electron gun for electron beam exposing device | |
JPS5388728A (en) | Method of forming pattern | |
JPS5423465A (en) | Electronic microscope | |
JPS53120277A (en) | Electron beam exposure device | |
JPS5413334A (en) | Exposure | |
JPS52113682A (en) | Trapezoid drawing apparatus | |
JPS53140963A (en) | Scanning electronic microscope | |
JPS526885A (en) | Oil press for forming | |
JPS53135580A (en) | Electron beam exposing method | |
JPS5330280A (en) | Electron beam exposure apparatus | |
JPS53132269A (en) | Electron beam pattern projector | |
JPS52119184A (en) | Electron beam exposing method | |
JPS5349957A (en) | Focusing method for electronic beam exposure device | |
JPS53144717A (en) | Reed hole forming method of reed musical instruments |