JPS52113682A - Trapezoid drawing apparatus - Google Patents
Trapezoid drawing apparatusInfo
- Publication number
- JPS52113682A JPS52113682A JP2925576A JP2925576A JPS52113682A JP S52113682 A JPS52113682 A JP S52113682A JP 2925576 A JP2925576 A JP 2925576A JP 2925576 A JP2925576 A JP 2925576A JP S52113682 A JPS52113682 A JP S52113682A
- Authority
- JP
- Japan
- Prior art keywords
- drawing apparatus
- trapezoid
- trapezoid drawing
- apraallelogram
- trig
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To increase the degree of freedom in pattern forming by electron beam scanning by making a trapezoid as a basic pattern and including a rectangle, apraallelogram and trig triangle in this drawing range.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2925576A JPS52113682A (en) | 1976-03-19 | 1976-03-19 | Trapezoid drawing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2925576A JPS52113682A (en) | 1976-03-19 | 1976-03-19 | Trapezoid drawing apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52113682A true JPS52113682A (en) | 1977-09-22 |
JPS5319904B2 JPS5319904B2 (en) | 1978-06-23 |
Family
ID=12271157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2925576A Granted JPS52113682A (en) | 1976-03-19 | 1976-03-19 | Trapezoid drawing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52113682A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55150229A (en) * | 1979-05-11 | 1980-11-22 | Fujitsu Ltd | Electron beam exposure device |
JPS6119124A (en) * | 1984-07-05 | 1986-01-28 | Matsushita Electric Ind Co Ltd | Scanning type exposer |
-
1976
- 1976-03-19 JP JP2925576A patent/JPS52113682A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55150229A (en) * | 1979-05-11 | 1980-11-22 | Fujitsu Ltd | Electron beam exposure device |
JPS6119124A (en) * | 1984-07-05 | 1986-01-28 | Matsushita Electric Ind Co Ltd | Scanning type exposer |
Also Published As
Publication number | Publication date |
---|---|
JPS5319904B2 (en) | 1978-06-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5412675A (en) | Electon beam exposure method | |
JPS52119178A (en) | Electron beam exposure device | |
JPS52151568A (en) | Electron beam exposure apparatus | |
JPS5316578A (en) | Electron beam exposure apparatus | |
JPS52143776A (en) | Electron beam exposure apparatus | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS52113682A (en) | Trapezoid drawing apparatus | |
JPS5359374A (en) | Electron beam exposure unit | |
JPS5362477A (en) | Electron beam drawing device | |
JPS5249770A (en) | Pattern inspection device | |
JPS5375768A (en) | Size check pattern | |
JPS5220859A (en) | Direction signal generator | |
JPS52117578A (en) | Electron beam exposing method | |
JPS5440572A (en) | Electron-beam pattern projector | |
JPS5437685A (en) | Electron beam exposure unit | |
JPS5350938A (en) | Generation of character pattern | |
JPS5353978A (en) | Rotating position relation adjusting method | |
JPS53120277A (en) | Electron beam exposure device | |
JPS5234780A (en) | Ultrasonic beam scaning apparatus | |
JPS5350978A (en) | Electron beam exposure method | |
JPS5313880A (en) | Fine patterning method | |
JPS5316577A (en) | Electron beam exposure apparatus | |
JPS5219958A (en) | Scanning electron microscope | |
JPS5315077A (en) | Electron beam deflection controlling apparatus | |
JPS52119184A (en) | Electron beam exposing method |