JPS57155539A - Mask - Google Patents

Mask

Info

Publication number
JPS57155539A
JPS57155539A JP4032881A JP4032881A JPS57155539A JP S57155539 A JPS57155539 A JP S57155539A JP 4032881 A JP4032881 A JP 4032881A JP 4032881 A JP4032881 A JP 4032881A JP S57155539 A JPS57155539 A JP S57155539A
Authority
JP
Japan
Prior art keywords
substrate
photomask
metallic layer
electron beam
beam drawing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4032881A
Other languages
Japanese (ja)
Inventor
Yoshikazu Tanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4032881A priority Critical patent/JPS57155539A/en
Publication of JPS57155539A publication Critical patent/JPS57155539A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To facilitate the ground of the substrate of a photomask manufactured by an electron beam drawing method and to eliminate trouble due to the charging of the substrate by forming a metallic layer on the side of the substrat as well as the surface. CONSTITUTION:A metallic layer 11 of chrominum or the like is formed on a glass substrate 10 for a photomask manufactured by an electron beam drawing method. At this time, in addition to the layer 10 a metallic layer 11a is formed on at least one side of the substrate 10, and a photoresist layer 12 is formed while exposing the metallic layer 11a. Accordingly, the photomask substrate can be easily grounded through a contact armature 17 in electron beam drawing, the surface of the photoresist is prevented from being flawed by the charging of the mask substrate due to incomplete ground, and a photomask capable of forming a correct and precise pattern is manufactured.
JP4032881A 1981-03-23 1981-03-23 Mask Pending JPS57155539A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4032881A JPS57155539A (en) 1981-03-23 1981-03-23 Mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4032881A JPS57155539A (en) 1981-03-23 1981-03-23 Mask

Publications (1)

Publication Number Publication Date
JPS57155539A true JPS57155539A (en) 1982-09-25

Family

ID=12577536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4032881A Pending JPS57155539A (en) 1981-03-23 1981-03-23 Mask

Country Status (1)

Country Link
JP (1) JPS57155539A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946124A (en) * 1982-09-07 1984-03-15 Nippon Sanso Kk Preparation of microcapsule
EP0228914A2 (en) 1985-12-28 1987-07-15 Konica Corporation Method of processing lightsensitive silver halide color photographic material
EP0468274A2 (en) * 1990-07-12 1992-01-29 Kabushiki Kaisha Toshiba Method of forming an electrode on a mask for manufacturing semiconductor devices, spinner for applying resist to a semiconductor-manufacturing mask, and mask-housing case
JPH04216550A (en) * 1990-12-18 1992-08-06 Mitsubishi Electric Corp Production of mask for exposure
JP2012238014A (en) * 2012-07-20 2012-12-06 Hoya Corp Mask blank and method for manufacturing transfer mask

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946124A (en) * 1982-09-07 1984-03-15 Nippon Sanso Kk Preparation of microcapsule
JPH0367736B2 (en) * 1982-09-07 1991-10-24 Nippon Oxygen Co Ltd
EP0228914A2 (en) 1985-12-28 1987-07-15 Konica Corporation Method of processing lightsensitive silver halide color photographic material
EP0468274A2 (en) * 1990-07-12 1992-01-29 Kabushiki Kaisha Toshiba Method of forming an electrode on a mask for manufacturing semiconductor devices, spinner for applying resist to a semiconductor-manufacturing mask, and mask-housing case
EP0468274A3 (en) * 1990-07-12 1993-07-28 Kabushiki Kaisha Toshiba Method of forming an electrode on a mask for manufacturing semiconductor devices, spinner for applying resist to a semiconductor-manufacturing mask, and mask-housing case
JPH04216550A (en) * 1990-12-18 1992-08-06 Mitsubishi Electric Corp Production of mask for exposure
JP2012238014A (en) * 2012-07-20 2012-12-06 Hoya Corp Mask blank and method for manufacturing transfer mask

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