JPS5417840A - Film forming method - Google Patents

Film forming method

Info

Publication number
JPS5417840A
JPS5417840A JP8328977A JP8328977A JPS5417840A JP S5417840 A JPS5417840 A JP S5417840A JP 8328977 A JP8328977 A JP 8328977A JP 8328977 A JP8328977 A JP 8328977A JP S5417840 A JPS5417840 A JP S5417840A
Authority
JP
Japan
Prior art keywords
film forming
forming method
film
substrate
entire surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8328977A
Other languages
Japanese (ja)
Inventor
Kenzo Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8328977A priority Critical patent/JPS5417840A/en
Publication of JPS5417840A publication Critical patent/JPS5417840A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To form a thick film in fine patterns by slightly etching the film formed over the entire surface before removing the photosensitive film selectively formed on a substrate and the film remained thereon.
JP8328977A 1977-07-11 1977-07-11 Film forming method Pending JPS5417840A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8328977A JPS5417840A (en) 1977-07-11 1977-07-11 Film forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8328977A JPS5417840A (en) 1977-07-11 1977-07-11 Film forming method

Publications (1)

Publication Number Publication Date
JPS5417840A true JPS5417840A (en) 1979-02-09

Family

ID=13798220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8328977A Pending JPS5417840A (en) 1977-07-11 1977-07-11 Film forming method

Country Status (1)

Country Link
JP (1) JPS5417840A (en)

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