JPS52113679A - Sputter etching method - Google Patents

Sputter etching method

Info

Publication number
JPS52113679A
JPS52113679A JP3033676A JP3033676A JPS52113679A JP S52113679 A JPS52113679 A JP S52113679A JP 3033676 A JP3033676 A JP 3033676A JP 3033676 A JP3033676 A JP 3033676A JP S52113679 A JPS52113679 A JP S52113679A
Authority
JP
Japan
Prior art keywords
sputter etching
etching method
mask material
covering
outside
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3033676A
Other languages
Japanese (ja)
Inventor
Noburo Yasuda
Takashi Mihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3033676A priority Critical patent/JPS52113679A/en
Publication of JPS52113679A publication Critical patent/JPS52113679A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To prevent delamination of film during sputter etching and improve yield by covering a conductive mask material further on the outside of the mask material on the outermost side in pattern forming regions.
COPYRIGHT: (C)1977,JPO&Japio
JP3033676A 1976-03-19 1976-03-19 Sputter etching method Pending JPS52113679A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3033676A JPS52113679A (en) 1976-03-19 1976-03-19 Sputter etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3033676A JPS52113679A (en) 1976-03-19 1976-03-19 Sputter etching method

Publications (1)

Publication Number Publication Date
JPS52113679A true JPS52113679A (en) 1977-09-22

Family

ID=12300966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3033676A Pending JPS52113679A (en) 1976-03-19 1976-03-19 Sputter etching method

Country Status (1)

Country Link
JP (1) JPS52113679A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115882A (en) * 1985-11-15 1987-05-27 Agency Of Ind Science & Technol Manufacture of josephson junction element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115882A (en) * 1985-11-15 1987-05-27 Agency Of Ind Science & Technol Manufacture of josephson junction element
JPH0513394B2 (en) * 1985-11-15 1993-02-22 Kogyo Gijutsuin

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