JPS5394771A - Forming method for thin film pattern - Google Patents

Forming method for thin film pattern

Info

Publication number
JPS5394771A
JPS5394771A JP900377A JP900377A JPS5394771A JP S5394771 A JPS5394771 A JP S5394771A JP 900377 A JP900377 A JP 900377A JP 900377 A JP900377 A JP 900377A JP S5394771 A JPS5394771 A JP S5394771A
Authority
JP
Japan
Prior art keywords
thin film
forming method
film pattern
pattern
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP900377A
Other languages
Japanese (ja)
Inventor
Mikio Segawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP900377A priority Critical patent/JPS5394771A/en
Publication of JPS5394771A publication Critical patent/JPS5394771A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: Without having a bad influence upon the resist on the pattern after the pattern formation, the only pattern is side-etched and the insulating material filled in the concave part of the pattern is made thin to provide a gap between the resist and the film, thereby simplify the formation of fine patterns.
COPYRIGHT: (C)1978,JPO&Japio
JP900377A 1977-01-29 1977-01-29 Forming method for thin film pattern Pending JPS5394771A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP900377A JPS5394771A (en) 1977-01-29 1977-01-29 Forming method for thin film pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP900377A JPS5394771A (en) 1977-01-29 1977-01-29 Forming method for thin film pattern

Publications (1)

Publication Number Publication Date
JPS5394771A true JPS5394771A (en) 1978-08-19

Family

ID=11708477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP900377A Pending JPS5394771A (en) 1977-01-29 1977-01-29 Forming method for thin film pattern

Country Status (1)

Country Link
JP (1) JPS5394771A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5618428A (en) * 1979-07-23 1981-02-21 Nippon Telegr & Teleph Corp <Ntt> Manufacture of semiconductor integrated circuit device
JPS5621332A (en) * 1979-07-31 1981-02-27 Fujitsu Ltd Manufacture of semiconductor device
JPS59197140A (en) * 1983-04-25 1984-11-08 Toshiba Corp Manufacture of semiconductor device
JPS62238617A (en) * 1986-04-09 1987-10-19 Oki Electric Ind Co Ltd Formation of substrate for forming single crystal thin film

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5618428A (en) * 1979-07-23 1981-02-21 Nippon Telegr & Teleph Corp <Ntt> Manufacture of semiconductor integrated circuit device
JPS5621332A (en) * 1979-07-31 1981-02-27 Fujitsu Ltd Manufacture of semiconductor device
JPS59197140A (en) * 1983-04-25 1984-11-08 Toshiba Corp Manufacture of semiconductor device
JPH0153500B2 (en) * 1983-04-25 1989-11-14 Tokyo Shibaura Electric Co
JPS62238617A (en) * 1986-04-09 1987-10-19 Oki Electric Ind Co Ltd Formation of substrate for forming single crystal thin film

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