JPS53118372A - Pattern formation by plasma etching method - Google Patents

Pattern formation by plasma etching method

Info

Publication number
JPS53118372A
JPS53118372A JP3361577A JP3361577A JPS53118372A JP S53118372 A JPS53118372 A JP S53118372A JP 3361577 A JP3361577 A JP 3361577A JP 3361577 A JP3361577 A JP 3361577A JP S53118372 A JPS53118372 A JP S53118372A
Authority
JP
Japan
Prior art keywords
plasma etching
etching method
pattern formation
pattern
material layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3361577A
Other languages
Japanese (ja)
Inventor
Junji Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP3361577A priority Critical patent/JPS53118372A/en
Publication of JPS53118372A publication Critical patent/JPS53118372A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a minute pattern in an accurate way by using two material layers of different component materials and furthermore by using the etching gas corresponding to the material layers when forming a pattern through plasma etching method.
COPYRIGHT: (C)1978,JPO&Japio
JP3361577A 1977-03-26 1977-03-26 Pattern formation by plasma etching method Pending JPS53118372A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3361577A JPS53118372A (en) 1977-03-26 1977-03-26 Pattern formation by plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3361577A JPS53118372A (en) 1977-03-26 1977-03-26 Pattern formation by plasma etching method

Publications (1)

Publication Number Publication Date
JPS53118372A true JPS53118372A (en) 1978-10-16

Family

ID=12391350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3361577A Pending JPS53118372A (en) 1977-03-26 1977-03-26 Pattern formation by plasma etching method

Country Status (1)

Country Link
JP (1) JPS53118372A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146236A (en) * 1980-04-16 1981-11-13 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146236A (en) * 1980-04-16 1981-11-13 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device

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